Plasma Enhanced-Chemical Vapour Deposition Furnace with Radio Frequency Generator, Gas Mix & Pumping System

Nasiri, Noushin (Primary Chief Investigator)
Bagnall, Darren (Chief Investigator)
Downes, James (Chief Investigator)
Mukhopadhyay, Subhas (Chief Investigator)
Strezov, Vladimir (Chief Investigator)
Brown, Louise (Chief Investigator)
Wu, Shuying (Chief Investigator)
Huang, Shujuan (Chief Investigator)
Cheng, Shaokoon (Chief Investigator)
Wong, Danny (Chief Investigator)
Lang, Candace (Chief Investigator)
Venkatesan, Koushik (Chief Investigator)
Payne, David (Chief Investigator)
P Veettil, Binesh (Chief Investigator)
Inglis, David (Chief Investigator)
Salehi, Fatemeh (Chief Investigator)

Project: Research

Description

This application seeks to purchase a Plasma Enhanced Chemical Vapour Deposition (PE-CVD) tube furnace equipped with gas mixing and pumping system. PECVD is a nanofabrication process to deposit nanostructured materials from a gas to a solid state on a substrate.

Short title	PE-CVD
Acronym	MQRIS S 2021
Status	Finished
Effective start/end date	1/01/21 → 31/12/21

Plasma Enhanced-Chemical Vapour Deposition Furnace with Radio Frequency Generator, Gas Mix & Pumping System

Project Details

Description