A physically-based model of vertical TFET-part II: drain current model

Qi Cheng, Sourabh Khandelwal, Yuping Zeng

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

A physics-based model for the tunneling current of vertical tunneling field transistors (TFET) is proposed. In part I, the expression of φ1D(x) is derived from the multi-branch general solutions of Poisson’s equation. The model’s results are verified with TCAD simulation for transistors with different materials, device geometries, and biases. In this article, a surface potential model is validated at different device regions which include channel and drain. Based on the above two electric potential models, Kane’s tunneling formula is utilized for the calculation of band-to-band tunneling current. The proposed current model is valid for all transistors’ operating regions. The quantum effect on the band-structure parameters is taken into account in the modeling of InAs vertical TFET. It is shown that the channel thickness needs to be optimized to achieve the highest drive current.

Original languageEnglish
Pages (from-to)3974-3982
Number of pages9
JournalIEEE Transactions on Electron Devices
Volume69
Issue number7
Early online date8 Feb 2022
DOIs
Publication statusPublished - Jul 2022

Fingerprint

Dive into the research topics of 'A physically-based model of vertical TFET-part II: drain current model'. Together they form a unique fingerprint.

Cite this