Adaptive optics for direct laser writing with plasma emission aberration sensing

Alexander Jesacher*, Graham D. Marshall, Tony Wilson, Martin J. Booth

*Corresponding author for this work

Research output: Contribution to journalArticle

37 Citations (Scopus)

Abstract

Aberrations affect the focal spot quality in direct laser write applications when focusing through a refractive index mismatch. Closed loop adaptive optics can correct these aberrations if a suitable feedback signal can be found. Focusing an ultrafast laser beam into transparent dielectric material can lead to plasma formation in the focal region. We report using the supercontinuum emitted by such a plasma to measure the optical aberrations, the subsequent aberration correction using a spatial light modulator and the fabrication of nanostructures using the corrected optical system.

Original languageEnglish
Pages (from-to)656-661
Number of pages6
JournalOptics Express
Volume18
Issue number2
DOIs
Publication statusPublished - 18 Jan 2010

Bibliographical note

This paper was published in Optics Express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-2-656. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.

Erratum can be found in Optics Express, Volume 18(15), 15399, http://dx.doi.org/10.1364/OE.18.015399

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