Abstract
The present disclosure provides methodologies for manufacturing photovoltaic devices. In particular, the disclosure relates to the use of hydrogen during manufacturing of photovoltaic devices for passivating defects in the silicon and addressing light-induced degradation. The methodologies in the present disclosures take advantage of generation and manipulation of hydrogen in the neutral or charged state to optimise defect passivation. Some of the methodologies disclose use thermal treatments, illumination with sub-bandgap photons, electric fields or defects in the silicon to control the state of charge or hydrogen, move hydrogen to different locations in the device or retain hydrogen at specific locations.
| Original language | English |
|---|---|
| Patent number | AU2017363826 |
| IPC | H01L 21/30,H01L 21/324 |
| Priority date | 22/11/16 |
| Publication status | Submitted - 31 May 2018 |
| Externally published | Yes |
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用于加工硅基光伏器件的方法
Wenham, S. R. (Inventor), Alison, C. (Inventor), Bagnall, D. (Inventor), Chen, R. (Inventor), Abbott, M. D. (Inventor), Hallam, B. J. (Inventor), Chan, C. E. (Inventor), Chong, C. M. (Inventor), Chen, D. (Inventor), Payne, D. N. (Inventor), Mai, L. (Inventor), Kim, M. (Inventor), Fung, T. H. (Inventor) & Shi, Z. (Inventor), 14 Jul 2023, IPC No. H01L 21/30, H01L 21/324, Patent No. 109983561, Priority date 22 Nov 2016, Priority No. AU2016904784Translated title of the contribution :Advanced hydrogen passivation that mitigates hydrogen-induced recombination (HIR) and surface passivation deterioration in PV devices Research output: Patent
Open Access
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