Angular-momentum nanometrology in an ultrathin plasmonic topological insulator film

Zengji Yue, Haoran Ren, Shibiao Wei, Jiao Lin, Min Gu

Research output: Contribution to journalArticlepeer-review

34 Citations (Scopus)
9 Downloads (Pure)

Abstract

Complementary metal–oxide–semiconductor (CMOS) technology has provided a highly sensitive detection platform for high-resolution optical imaging, sensing and metrology. Although the detection of optical beams carrying angular momentum have been explored with nanophotonic methods, the metrology of optical angular momentum has been limited to bulk optics. We demonstrate angular-momentum nanometrology through the spatial displacement engineering of plasmonic angular momentum modes in a CMOS-compatible plasmonic topological insulator material. The generation and propagation of surface plasmon polaritons on the surface of an ultrathin topological insulator Sb 2Te 3 film with a thickness of 100 nm is confirmed, exhibiting plasmonic figures of merit superior to noble metal plasmonics in the ultraviolet-visible frequency range. Angular-momentum nanometrology with a low crosstalk of less than −20 dB is achieved. This compact high-precision angular-momentum nanometrology opens an unprecedented opportunity for on-chip manipulation of optical angular momentum for high-capacity information processing, ultrasensitive molecular sensing, and ultracompact multi-functional optoelectronic devices.

Original languageEnglish
Article number4413
Number of pages7
JournalNature Communications
Volume9
Issue number1
DOIs
Publication statusPublished - 24 Oct 2018
Externally publishedYes

Bibliographical note

Copyright © The Author(s) 2018. Version archived for private and non-commercial use with the permission of the author/s and according to publisher conditions. For further rights please contact the publisher.

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