Cell culture substrates

Adam Martin (Inventor), Lars Matthias Ittner (Inventor), Yazi Diana Ke (Inventor)

    Research output: Patent


    The present application describes a class of peptides comprising from (2) to (12) amino acid residues, wherein: the N-terminus of the peptide is linked to an optionally substituted, fused polycyclic group comprising an aromatic ring; at least one amino acid residue has a hydrophobic side chain; at least two amino acid residues have a cation-containing side chain, or at least one amino acid residue has two or more cation-containing side chains, or at least one amino acid residue has one or more side chains comprising two or more cations; and the net charge of the peptide is positive at a pH of from about (4) to about (10). The present application also describes hydrogels and cell culture substrates comprising the peptides, as well as the use of the cell culture substrates for culturing cells.

    Original languageEnglish
    Patent numberWO2019033171
    IPCC07K 5/10 2006.01
    Priority date16/08/17
    Filing date16/08/18
    Publication statusSubmitted - 21 Feb 2019

    Bibliographical note

    Designated States:
    AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
    African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
    Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
    European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
    African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)


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