Abstract
Operating channel temperature has an important influence on the electrical performance and reliability of GaAs FET amplifiers but this parameter is difficult to determine experimentally or analytically. Simplified closed-form and numerical models are commonly used although both are subject to errors in the case of sub-micron heat sources surrounded by epitaxial layers. Some assumptions about the heat source size and location are explored using finite-difference simulation. A simple measurement technique making use of the temperature coefficient of gate metal resistance is described, and an improved procedure for spatial averaging correction of infrared measurements of sub-micron heat sources is proposed.
| Original language | English |
|---|---|
| Title of host publication | 2010 IEEE MTT-S International Microwave Symposium, MTT 2010 |
| Place of Publication | Piscataway, NJ |
| Publisher | Institute of Electrical and Electronics Engineers (IEEE) |
| Pages | 320-323 |
| Number of pages | 4 |
| ISBN (Print) | 9781424477326 |
| DOIs | |
| Publication status | Published - 2010 |
| Event | 2010 IEEE MTT-S International Microwave Symposium, MTT - 2010 - Anaheim, United States Duration: 23 May 2010 → 28 May 2010 |
Other
| Other | 2010 IEEE MTT-S International Microwave Symposium, MTT - 2010 |
|---|---|
| Country/Territory | United States |
| City | Anaheim |
| Period | 23/05/10 → 28/05/10 |
Keywords
- Channel temperature
- FET amplifiers
- Heat flow
- Infrared measurement
- Junction temperature
- Temperature measurement
- Thermal analysis
- Thermal modeling
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