Characteristics of 2-photon ultraviolet laser etching of diamond

R. P. Mildren*, J. E. Downes, J. D. Brown, B. F. Johnston, E. Granados, D. J. Spence, A. Lehmann, L. Weston, A. Bramble

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

25 Citations (Scopus)
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We report graphite-free laser etching of diamond surfaces using 266 nm laser pulses for a wide range of incident fluences below the threshold for ablation. The etching rate is proportional to the (fluence)x where x = 1.88 ± 0.16 over the range 10-6 - 10-2 nm per pulse for incident pulse fluences 1 - 60 J/cm2. Surface sensitive near edge x-ray fine absorption structure measurements (partial electron yield NEXAFS) reveal that etching does not significantly alter the surface structure from the initial oxygen terminated and graphite-free state. The etching process, which is consistent with a mechanism involving the desorption of carbon species via the decay of 2-photon excited excitons near the surface, appears to have no threshold and is promising for creating a range of high resolution structures.

Original languageEnglish
Pages (from-to)576-585
Number of pages10
JournalOptical Materials Express
Issue number4
Publication statusPublished - 1 Aug 2011

Bibliographical note

This paper was published in Optical materials express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.


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