Characterization of the nonlinear susceptibility of monolayer MoS2 using second- and third-harmonic generation microscopy

R. I. Woodward; R. T. Murray; C. F. Phelan; R. E. P. de Oliveira; S. Li; G. Eda; C. J. S. de Matos

doi:10.1364/CLEO_SI.2016.STu1R.3

Characterization of the nonlinear susceptibility of monolayer MoS₂using second- and third-harmonic generation microscopy

R. I. Woodward^*, R. T. Murray, C. F. Phelan, R. E. P. de Oliveira, S. Li, G. Eda, C. J. S. de Matos

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference proceeding contribution › peer-review

2 Citations (Scopus)

Abstract

Second-and third-harmonic generation microscopy of monolayer MoS₂ is reported for imaging and characterization of the material's nonlinearity. A telecommunication wavelength pump is used, revealing the material's promise for use in nonlinear optical devices.

Original language	English
Title of host publication	CLEO: Science and Innovations 2016
Subtitle of host publication	Technical Digest
Place of Publication	Washington, DC
Publisher	OSA Publishing
Number of pages	2
ISBN (Electronic)	9781943580118
DOIs	https://doi.org/10.1364/CLEO_SI.2016.STu1R.3
Publication status	Published - 2016
Externally published	Yes
Event	Conference on Lasers and Electro-Optics (CLEO) - San Jose, United States Duration: 5 Jun 2016 → 10 Jun 2016

Publication series

Name	Conference on Lasers and Electro-Optics
Publisher	IEEE
ISSN (Print)	2160-9020

Conference

Conference	Conference on Lasers and Electro-Optics (CLEO)
Country/Territory	United States
City	San Jose
Period	5/06/16 → 10/06/16

Access to Document

10.1364/CLEO_SI.2016.STu1R.3

Cite this

Woodward, R. I., Murray, R. T., Phelan, C. F., de Oliveira, R. E. P., Li, S., Eda, G., & de Matos, C. J. S. (2016). Characterization of the nonlinear susceptibility of monolayer MoS₂using second- and third-harmonic generation microscopy. In CLEO: Science and Innovations 2016: Technical Digest Article STu1R.3 (Conference on Lasers and Electro-Optics). OSA Publishing. https://doi.org/10.1364/CLEO_SI.2016.STu1R.3

@inproceedings{084fb8842aa9437aa2f95c70e40147c6,

title = "Characterization of the nonlinear susceptibility of monolayer MoS2 using second- and third-harmonic generation microscopy",

abstract = "Second-and third-harmonic generation microscopy of monolayer MoS2 is reported for imaging and characterization of the material's nonlinearity. A telecommunication wavelength pump is used, revealing the material's promise for use in nonlinear optical devices.",

author = "Woodward, {R. I.} and Murray, {R. T.} and Phelan, {C. F.} and {de Oliveira}, {R. E. P.} and S. Li and G. Eda and {de Matos}, {C. J. S.}",

year = "2016",

doi = "10.1364/CLEO_SI.2016.STu1R.3",

language = "English",

series = "Conference on Lasers and Electro-Optics",

publisher = "OSA Publishing",

booktitle = "CLEO: Science and Innovations 2016",

address = "United States",

note = "Conference on Lasers and Electro-Optics (CLEO) ; Conference date: 05-06-2016 Through 10-06-2016",

}

Woodward, RI, Murray, RT, Phelan, CF, de Oliveira, REP, Li, S, Eda, G & de Matos, CJS 2016, Characterization of the nonlinear susceptibility of monolayer MoS₂using second- and third-harmonic generation microscopy. in CLEO: Science and Innovations 2016: Technical Digest., STu1R.3, Conference on Lasers and Electro-Optics, OSA Publishing, Washington, DC , Conference on Lasers and Electro-Optics (CLEO), San Jose, California, United States, 5/06/16. https://doi.org/10.1364/CLEO_SI.2016.STu1R.3

Characterization of the nonlinear susceptibility of monolayer MoS₂using second- and third-harmonic generation microscopy. / Woodward, R. I.; Murray, R. T.; Phelan, C. F. et al.
CLEO: Science and Innovations 2016: Technical Digest. Washington, DC : OSA Publishing, 2016. STu1R.3 (Conference on Lasers and Electro-Optics).

Research output: Chapter in Book/Report/Conference proceeding › Conference proceeding contribution › peer-review

TY - GEN

T1 - Characterization of the nonlinear susceptibility of monolayer MoS2 using second- and third-harmonic generation microscopy

AU - Woodward, R. I.

AU - Murray, R. T.

AU - Phelan, C. F.

AU - de Oliveira, R. E. P.

AU - Li, S.

AU - Eda, G.

AU - de Matos, C. J. S.

PY - 2016

Y1 - 2016

N2 - Second-and third-harmonic generation microscopy of monolayer MoS2 is reported for imaging and characterization of the material's nonlinearity. A telecommunication wavelength pump is used, revealing the material's promise for use in nonlinear optical devices.

AB - Second-and third-harmonic generation microscopy of monolayer MoS2 is reported for imaging and characterization of the material's nonlinearity. A telecommunication wavelength pump is used, revealing the material's promise for use in nonlinear optical devices.

UR - http://www.scopus.com/inward/record.url?scp=85010637711&partnerID=8YFLogxK

U2 - 10.1364/CLEO_SI.2016.STu1R.3

DO - 10.1364/CLEO_SI.2016.STu1R.3

M3 - Conference proceeding contribution

T3 - Conference on Lasers and Electro-Optics

BT - CLEO: Science and Innovations 2016

PB - OSA Publishing

CY - Washington, DC

T2 - Conference on Lasers and Electro-Optics (CLEO)

Y2 - 5 June 2016 through 10 June 2016

ER -

Woodward RI, Murray RT, Phelan CF, de Oliveira REP, Li S, Eda G et al. Characterization of the nonlinear susceptibility of monolayer MoS₂using second- and third-harmonic generation microscopy. In CLEO: Science and Innovations 2016: Technical Digest. Washington, DC : OSA Publishing. 2016. STu1R.3. (Conference on Lasers and Electro-Optics). doi: 10.1364/CLEO_SI.2016.STu1R.3