Characterization of the second- and third-order nonlinear optical susceptibilities of monolayer MoS2 using multiphoton microscopy

R. I. Woodward; R. T. Murray; C. F. Phelan; R. E. P. de Oliveira; T. H. Runcorn; E. J. R. Kelleher; S. Li; E. C. de Oliveira; G. J. M. Fechine; G. Eda; C. J. S. de Matos

doi:10.1088/2053-1583/4/1/011006

Characterization of the second- and third-order nonlinear optical susceptibilities of monolayer MoS₂ using multiphoton microscopy

R. I. Woodward, R. T. Murray, C. F. Phelan, R. E. P. de Oliveira, T. H. Runcorn, E. J. R. Kelleher, S. Li, E. C. de Oliveira, G. J. M. Fechine, G. Eda, C. J. S. de Matos

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Abstract

We report second- and third-harmonic generation in monolayer MoS₂ as a tool for imaging and accurately characterizing the material's nonlinear optical properties under 1560 nm excitation. Using a surface nonlinear optics treatment, we derive expressions relating experimental measurements to second- and third-order nonlinear sheet susceptibility magnitudes, obtaining values of |χ_s⁽²⁾| = 2.0 × 10^-20 m² V^-1 and, for the first time for monolayer MoS₂, |χ_s⁽³⁾| = 1.7 × 10^-28 m³ V^-2. These sheet susceptibilities correspond to effective bulk nonlinear susceptibility values of |χ_b⁽²⁾| = 2.9 × 10^-11 m V^-1 and |χ_b⁽³⁾| = 2.4 × 10^-19 m² V^-2, accounting for the sheet thickness. Experimental comparisons between MoS₂ and graphene are also performed, demonstrating ∼3.4 times stronger third-order sheet nonlinearity in monolayer MoS₂, highlighting the material's potential for nonlinear photonics in the telecommunications C band.

Original language	English
Article number	011006
Number of pages	7
Journal	2D Materials
Volume	4
Issue number	1
DOIs	https://doi.org/10.1088/2053-1583/4/1/011006
Publication status	Published - Mar 2017
Externally published	Yes

Keywords

MoS₂
two-dimensional (2D) materials
second-harmonic generation
third-harmonic generation
multiphoton microscopy

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10.1088/2053-1583/4/1/011006Licence: CC BY

Publisher version (open access)Final published version, 1.17 MBLicence: CC BY

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Woodward, R. I., Murray, R. T., Phelan, C. F., de Oliveira, R. E. P., Runcorn, T. H., Kelleher, E. J. R., Li, S., de Oliveira, E. C., Fechine, G. J. M., Eda, G., & de Matos, C. J. S. (2017). Characterization of the second- and third-order nonlinear optical susceptibilities of monolayer MoS₂ using multiphoton microscopy. 2D Materials, 4(1), Article 011006. https://doi.org/10.1088/2053-1583/4/1/011006

@article{79b468f896524215bcec4b56806904e1,

title = "Characterization of the second- and third-order nonlinear optical susceptibilities of monolayer MoS2 using multiphoton microscopy",

abstract = "We report second- and third-harmonic generation in monolayer MoS2 as a tool for imaging and accurately characterizing the material's nonlinear optical properties under 1560 nm excitation. Using a surface nonlinear optics treatment, we derive expressions relating experimental measurements to second- and third-order nonlinear sheet susceptibility magnitudes, obtaining values of |χs(2)| = 2.0 × 10-20 m2 V-1 and, for the first time for monolayer MoS2, |χs(3)| = 1.7 × 10-28 m3 V-2. These sheet susceptibilities correspond to effective bulk nonlinear susceptibility values of |χb(2)| = 2.9 × 10-11 m V-1 and |χb(3)| = 2.4 × 10-19 m2 V-2, accounting for the sheet thickness. Experimental comparisons between MoS2 and graphene are also performed, demonstrating ∼3.4 times stronger third-order sheet nonlinearity in monolayer MoS2, highlighting the material's potential for nonlinear photonics in the telecommunications C band.",

keywords = "MoS₂, two-dimensional (2D) materials, second-harmonic generation, third-harmonic generation, multiphoton microscopy",

author = "Woodward, \{R. I.\} and Murray, \{R. T.\} and Phelan, \{C. F.\} and \{de Oliveira\}, \{R. E. P.\} and Runcorn, \{T. H.\} and Kelleher, \{E. J. R.\} and S. Li and \{de Oliveira\}, \{E. C.\} and Fechine, \{G. J. M.\} and G. Eda and \{de Matos\}, \{C. J. S.\}",

year = "2017",

month = mar,

doi = "10.1088/2053-1583/4/1/011006",

language = "English",

volume = "4",

journal = "2D Materials",

issn = "2053-1583",

publisher = "IOP Publishing",

number = "1",

}

TY - JOUR

T1 - Characterization of the second- and third-order nonlinear optical susceptibilities of monolayer MoS2 using multiphoton microscopy

AU - Woodward, R. I.

AU - Murray, R. T.

AU - Phelan, C. F.

AU - de Oliveira, R. E. P.

AU - Runcorn, T. H.

AU - Kelleher, E. J. R.

AU - Li, S.

AU - de Oliveira, E. C.

AU - Fechine, G. J. M.

AU - Eda, G.

AU - de Matos, C. J. S.

PY - 2017/3

Y1 - 2017/3

N2 - We report second- and third-harmonic generation in monolayer MoS2 as a tool for imaging and accurately characterizing the material's nonlinear optical properties under 1560 nm excitation. Using a surface nonlinear optics treatment, we derive expressions relating experimental measurements to second- and third-order nonlinear sheet susceptibility magnitudes, obtaining values of |χs(2)| = 2.0 × 10-20 m2 V-1 and, for the first time for monolayer MoS2, |χs(3)| = 1.7 × 10-28 m3 V-2. These sheet susceptibilities correspond to effective bulk nonlinear susceptibility values of |χb(2)| = 2.9 × 10-11 m V-1 and |χb(3)| = 2.4 × 10-19 m2 V-2, accounting for the sheet thickness. Experimental comparisons between MoS2 and graphene are also performed, demonstrating ∼3.4 times stronger third-order sheet nonlinearity in monolayer MoS2, highlighting the material's potential for nonlinear photonics in the telecommunications C band.

AB - We report second- and third-harmonic generation in monolayer MoS2 as a tool for imaging and accurately characterizing the material's nonlinear optical properties under 1560 nm excitation. Using a surface nonlinear optics treatment, we derive expressions relating experimental measurements to second- and third-order nonlinear sheet susceptibility magnitudes, obtaining values of |χs(2)| = 2.0 × 10-20 m2 V-1 and, for the first time for monolayer MoS2, |χs(3)| = 1.7 × 10-28 m3 V-2. These sheet susceptibilities correspond to effective bulk nonlinear susceptibility values of |χb(2)| = 2.9 × 10-11 m V-1 and |χb(3)| = 2.4 × 10-19 m2 V-2, accounting for the sheet thickness. Experimental comparisons between MoS2 and graphene are also performed, demonstrating ∼3.4 times stronger third-order sheet nonlinearity in monolayer MoS2, highlighting the material's potential for nonlinear photonics in the telecommunications C band.

KW - MoS₂

KW - two-dimensional (2D) materials

KW - second-harmonic generation

KW - third-harmonic generation

KW - multiphoton microscopy

UR - https://www.scopus.com/pages/publications/85014437519

U2 - 10.1088/2053-1583/4/1/011006

DO - 10.1088/2053-1583/4/1/011006

M3 - Article

AN - SCOPUS:85014437519

SN - 2053-1583

VL - 4

JO - 2D Materials

JF - 2D Materials

IS - 1

M1 - 011006

ER -

Characterization of the second- and third-order nonlinear optical susceptibilities of monolayer MoS₂ using multiphoton microscopy

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