Chua's chaotic oscillator as the GaAs manufacturing process state indicator

Evgeny Kuxa*, Anthony E. Parker, Simon J. Mahon, Anthony P. Fattorini, Wen Kai Wang, Richard Kuo, Michael C. Heimlich

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference proceeding contributionpeer-review


This paper presents the results of the measurements of a GaAs Chua's circuit used for a new manufacturing process monitor. The proposed monitoring method is suggested to replace or complement the PCM which appears to be less predictive for more complex and nonlinear circuits. The chaotic signal generated by the circuit was recorded and the capacitor voltage equilibrium points were recovered from the time-series. It is shown that there exists a strong correlation between the equilibrium points' separation and many of the PCM parameters, such as transistor threshold voltage and drain current. The correlation demonstrates that the Chua's circuit is sensitive to the process variations which makes this circuit a vital candidate for the circuit control monitor (CCM).

Original languageEnglish
Title of host publication2014 Asia-Pacific Microwave Conference Proceedings, APMC 2014
Place of PublicationPiscataway, NJ
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Number of pages3
ISBN (Electronic)9784902339314
ISBN (Print)9784902339314
Publication statusPublished - 25 Mar 2014
Event2014 Asia-Pacific Microwave Conference, APMC 2014 - Sendai, Japan
Duration: 4 Nov 20147 Nov 2014

Publication series

NameAsia Pacific Microwave Conference-Proceedings


Other2014 Asia-Pacific Microwave Conference, APMC 2014


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