Consistent surface-potential-based modeling of drain and gate currents in AlGaN/GaN HEMTs

Sayed Ali Albahrani*, Lars Heuken, Dirk Schwantuschke, Thomas Gneiting, Joachim N. Burghartz, Sourabh Khandelwal

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)
3 Downloads (Pure)


In this article, the gate current in AlGaN/GaN high-electron mobility transistors is modeled in a surface potential-based compact model. The thermionic emission, the Poole-Frenkel emission, and the Fowler-Nordheim tunneling are the dominant mechanisms for the gate current in the forward-and reverse-bias regions. These conduction mechanisms are modeled within the framework of the ASM-GaN compact model, which is a physics-based industry-standard model for GaN HEMTs, hence yielding a consistent model for the drain and gate currents. The proposed model captures the gate voltage, drain voltage, temperature, and gate-length dependencies of the gate current. The results of dc gate-leakage measurements of two GaN HEMT, differing only in terms of gate length, over a wide range of temperature, showing these current-conduction mechanisms, are presented, and the proposed model is validated accordingly. The developed gate current model, implemented in Verilog-A, is in excellent agreement with the experimental data.

Original languageEnglish
Pages (from-to)455-462
Number of pages8
JournalIEEE Transactions on Electron Devices
Issue number2
Publication statusPublished - Feb 2020

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