Control of stress and delamination in single and multi-layer carbon thin films prepared by cathodic arc and RF plasma deposition and implantation

Thang Cao Ha, David McKenzie, M M M Bilek, E D Doyle, P K Chu

Research output: Contribution to journalArticleResearchpeer-review

LanguageEnglish
Pages6405-6408
Number of pages4
JournalSurface and Coatings Technology
Volume200
Issue number22-23
DOIs
Publication statusPublished - 2006
Externally publishedYes

Cite this

Ha, Thang Cao ; McKenzie, David ; Bilek, M M M ; Doyle, E D ; Chu, P K. / Control of stress and delamination in single and multi-layer carbon thin films prepared by cathodic arc and RF plasma deposition and implantation. In: Surface and Coatings Technology. 2006 ; Vol. 200, No. 22-23. pp. 6405-6408.
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author = "Ha, {Thang Cao} and David McKenzie and Bilek, {M M M} and Doyle, {E D} and Chu, {P K}",
year = "2006",
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issn = "0257-8972",
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Control of stress and delamination in single and multi-layer carbon thin films prepared by cathodic arc and RF plasma deposition and implantation. / Ha, Thang Cao; McKenzie, David; Bilek, M M M; Doyle, E D; Chu, P K.

In: Surface and Coatings Technology, Vol. 200, No. 22-23, 2006, p. 6405-6408.

Research output: Contribution to journalArticleResearchpeer-review

TY - JOUR

T1 - Control of stress and delamination in single and multi-layer carbon thin films prepared by cathodic arc and RF plasma deposition and implantation

AU - Ha, Thang Cao

AU - McKenzie, David

AU - Bilek, M M M

AU - Doyle, E D

AU - Chu, P K

PY - 2006

Y1 - 2006

U2 - 10.1016/j.surfcoat.2005.11.011

DO - 10.1016/j.surfcoat.2005.11.011

M3 - Article

VL - 200

SP - 6405

EP - 6408

JO - Surface and Coatings Technology

T2 - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

IS - 22-23

ER -