Creation of adhesion resistant silica glass surfaces with ultraviolet laser cleaning

D. R. Halfpenny; D. M. Kane; R. N. Lamb; B. Gong

doi:10.1109/COMMAD.1996.610168

Creation of adhesion resistant silica glass surfaces with ultraviolet laser cleaning

D. R. Halfpenny^*, D. M. Kane, R. N. Lamb, B. Gong

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference proceeding contribution › peer-review

5 Citations (Scopus)

Abstract

By using the ultraviolet irradiation from a frequency doubled copper vapour laser, in the fluence range used for laser cleaning, the surface chemistry of silica can be modified. Analysis has shown that the surface is dehydroxylated by the UV light changing it from hydrophilic to hydrophobic in nature. The modification of the surface has the effect of reducing the number of particles that adhere to the treated surface by up to 80%, for 0.3 μm diameter particles, upon subsequent contamination of the surface.

Original language	English
Title of host publication	Conference on Optoelectronic & Microelectronic Materials and Devices, Proceedings, COMMAD
Place of Publication	Piscataway, NJ
Publisher	Institute of Electrical and Electronics Engineers (IEEE)
Pages	470-473
Number of pages	4
DOIs	https://doi.org/10.1109/COMMAD.1996.610168
Publication status	Published - 1996
Event	Proceedings of the 1996 Conference on Optoelectronic & Microelectronic Materials and Devices, COMMAD - Canberra, Aust Duration: 8 Dec 1996 → 11 Dec 1996

Other

Other	Proceedings of the 1996 Conference on Optoelectronic & Microelectronic Materials and Devices, COMMAD
City	Canberra, Aust
Period	8/12/96 → 11/12/96

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10.1109/COMMAD.1996.610168

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title = "Creation of adhesion resistant silica glass surfaces with ultraviolet laser cleaning",

abstract = "By using the ultraviolet irradiation from a frequency doubled copper vapour laser, in the fluence range used for laser cleaning, the surface chemistry of silica can be modified. Analysis has shown that the surface is dehydroxylated by the UV light changing it from hydrophilic to hydrophobic in nature. The modification of the surface has the effect of reducing the number of particles that adhere to the treated surface by up to 80%, for 0.3 μm diameter particles, upon subsequent contamination of the surface.",

author = "Halfpenny, {D. R.} and Kane, {D. M.} and Lamb, {R. N.} and B. Gong",

year = "1996",

doi = "10.1109/COMMAD.1996.610168",

language = "English",

pages = "470--473",

booktitle = "Conference on Optoelectronic & Microelectronic Materials and Devices, Proceedings, COMMAD",

publisher = "Institute of Electrical and Electronics Engineers (IEEE)",

address = "United States",

note = "Proceedings of the 1996 Conference on Optoelectronic & Microelectronic Materials and Devices, COMMAD ; Conference date: 08-12-1996 Through 11-12-1996",

}

Halfpenny, DR, Kane, DM, Lamb, RN & Gong, B 1996, Creation of adhesion resistant silica glass surfaces with ultraviolet laser cleaning. in Conference on Optoelectronic & Microelectronic Materials and Devices, Proceedings, COMMAD. Institute of Electrical and Electronics Engineers (IEEE), Piscataway, NJ, pp. 470-473, Proceedings of the 1996 Conference on Optoelectronic & Microelectronic Materials and Devices, COMMAD, Canberra, Aust, 8/12/96. https://doi.org/10.1109/COMMAD.1996.610168

Creation of adhesion resistant silica glass surfaces with ultraviolet laser cleaning. / Halfpenny, D. R.; Kane, D. M.; Lamb, R. N. et al.
Conference on Optoelectronic & Microelectronic Materials and Devices, Proceedings, COMMAD. Piscataway, NJ: Institute of Electrical and Electronics Engineers (IEEE), 1996. p. 470-473.

Research output: Chapter in Book/Report/Conference proceeding › Conference proceeding contribution › peer-review

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AU - Kane, D. M.

AU - Lamb, R. N.

AU - Gong, B.

PY - 1996

Y1 - 1996

N2 - By using the ultraviolet irradiation from a frequency doubled copper vapour laser, in the fluence range used for laser cleaning, the surface chemistry of silica can be modified. Analysis has shown that the surface is dehydroxylated by the UV light changing it from hydrophilic to hydrophobic in nature. The modification of the surface has the effect of reducing the number of particles that adhere to the treated surface by up to 80%, for 0.3 μm diameter particles, upon subsequent contamination of the surface.

AB - By using the ultraviolet irradiation from a frequency doubled copper vapour laser, in the fluence range used for laser cleaning, the surface chemistry of silica can be modified. Analysis has shown that the surface is dehydroxylated by the UV light changing it from hydrophilic to hydrophobic in nature. The modification of the surface has the effect of reducing the number of particles that adhere to the treated surface by up to 80%, for 0.3 μm diameter particles, upon subsequent contamination of the surface.

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DO - 10.1109/COMMAD.1996.610168

M3 - Conference proceeding contribution

AN - SCOPUS:0030356713

SP - 470

EP - 473

BT - Conference on Optoelectronic & Microelectronic Materials and Devices, Proceedings, COMMAD

PB - Institute of Electrical and Electronics Engineers (IEEE)

CY - Piscataway, NJ

T2 - Proceedings of the 1996 Conference on Optoelectronic & Microelectronic Materials and Devices, COMMAD

Y2 - 8 December 1996 through 11 December 1996

ER -

Creation of adhesion resistant silica glass surfaces with ultraviolet laser cleaning

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