Dehydroxylation of UV fused silica slides via UV laser irradiation

A. J. Fernandes, D. M. Kane, B. Gong, R. N. Lamb

Research output: Chapter in Book/Report/Conference proceedingConference proceeding contribution

3 Citations (Scopus)
9 Downloads (Pure)

Abstract

Further advances have been made in the development and understanding of an ultraviolet (UV) laser treatment of fused silica glass. Hydroxyl groups present on the surface can be removed by the treatment. The surface hydroxyl groups affect the surface adhesion [1] and performance of silica in catalysis, chromatography, photonics and microelectronics [2, 3]. This work shows that dehydroxylation via laser irradiation is a thermal process. An analysis technique using mass spectrometry has been developed to elucidate and avoid the effect of hydrocarbon contamination, allowing systematic measurements of dehydroxylation to be performed.

Original languageEnglish
Title of host publication2002 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Proceedings
EditorsMichael Gal
Place of PublicationPiscataway, NJ
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Pages433-436
Number of pages4
ISBN (Print)0780375718
DOIs
Publication statusPublished - 2002
EventConference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Sydney, Australia
Duration: 11 Dec 200213 Dec 2002

Other

OtherConference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002
CountryAustralia
CitySydney
Period11/12/0213/12/02

Bibliographical note

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