TY - GEN
T1 - Dehydroxylation of UV fused silica slides via UV laser irradiation
AU - Fernandes, A. J.
AU - Kane, D. M.
AU - Gong, B.
AU - Lamb, R. N.
N1 - Copyright 2003 IEEE. Reprinted from Proceedings of the 2002 conference on optoelectronic and microelectronic materials and devices. This material is posted here with permission of the IEEE. Such permission of the IEEE does not in any way imply IEEE endorsement of any of Macquarie University’s products or services. Internal or personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution must be obtained from the IEEE by writing to [email protected]. By choosing to view this document, you agree to all provisions of the copyright laws protecting it.
PY - 2002
Y1 - 2002
N2 - Further advances have been made in the development and understanding of an ultraviolet (UV) laser treatment of fused silica glass. Hydroxyl groups present on the surface can be removed by the treatment. The surface hydroxyl groups affect the surface adhesion [1] and performance of silica in catalysis, chromatography, photonics and microelectronics [2, 3]. This work shows that dehydroxylation via laser irradiation is a thermal process. An analysis technique using mass spectrometry has been developed to elucidate and avoid the effect of hydrocarbon contamination, allowing systematic measurements of dehydroxylation to be performed.
AB - Further advances have been made in the development and understanding of an ultraviolet (UV) laser treatment of fused silica glass. Hydroxyl groups present on the surface can be removed by the treatment. The surface hydroxyl groups affect the surface adhesion [1] and performance of silica in catalysis, chromatography, photonics and microelectronics [2, 3]. This work shows that dehydroxylation via laser irradiation is a thermal process. An analysis technique using mass spectrometry has been developed to elucidate and avoid the effect of hydrocarbon contamination, allowing systematic measurements of dehydroxylation to be performed.
UR - http://www.scopus.com/inward/record.url?scp=84882367648&partnerID=8YFLogxK
U2 - 10.1109/COMMAD.2002.1237283
DO - 10.1109/COMMAD.2002.1237283
M3 - Conference proceeding contribution
AN - SCOPUS:84882367648
SN - 0780375718
SP - 433
EP - 436
BT - 2002 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Proceedings
A2 - Gal, Michael
PB - Institute of Electrical and Electronics Engineers (IEEE)
CY - Piscataway, NJ
T2 - Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002
Y2 - 11 December 2002 through 13 December 2002
ER -