Dehydroxylation of UV fused silica slides via UV laser irradiation

A. J. Fernandes; D. M. Kane; B. Gong; R. N. Lamb

doi:10.1109/COMMAD.2002.1237283

Dehydroxylation of UV fused silica slides via UV laser irradiation

A. J. Fernandes, D. M. Kane, B. Gong, R. N. Lamb

Faculty of Science and Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference proceeding contribution › peer-review

5 Citations (Scopus)

54 Downloads (Pure)

Abstract

Further advances have been made in the development and understanding of an ultraviolet (UV) laser treatment of fused silica glass. Hydroxyl groups present on the surface can be removed by the treatment. The surface hydroxyl groups affect the surface adhesion [1] and performance of silica in catalysis, chromatography, photonics and microelectronics [2, 3]. This work shows that dehydroxylation via laser irradiation is a thermal process. An analysis technique using mass spectrometry has been developed to elucidate and avoid the effect of hydrocarbon contamination, allowing systematic measurements of dehydroxylation to be performed.

Original language	English
Title of host publication	2002 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Proceedings
Editors	Michael Gal
Place of Publication	Piscataway, NJ
Publisher	Institute of Electrical and Electronics Engineers (IEEE)
Pages	433-436
Number of pages	4
ISBN (Print)	0780375718
DOIs	https://doi.org/10.1109/COMMAD.2002.1237283
Publication status	Published - 2002
Event	Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Sydney, Australia Duration: 11 Dec 2002 → 13 Dec 2002

Other

Other	Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002
Country/Territory	Australia
City	Sydney
Period	11/12/02 → 13/12/02

Bibliographical note

Copyright 2003 IEEE. Reprinted from Proceedings of the 2002 conference on optoelectronic and microelectronic materials and devices. This material is posted here with permission of the IEEE. Such permission of the IEEE does not in any way imply IEEE endorsement of any of Macquarie Universityâ€™s products or services. Internal or personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution must be obtained from the IEEE by writing to [email protected]. By choosing to view this document, you agree to all provisions of the copyright laws protecting it.

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Fernandes, A. J., Kane, D. M., Gong, B., & Lamb, R. N. (2002). Dehydroxylation of UV fused silica slides via UV laser irradiation. In M. Gal (Ed.), 2002 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Proceedings (pp. 433-436). Article 1237283 Institute of Electrical and Electronics Engineers (IEEE). https://doi.org/10.1109/COMMAD.2002.1237283

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note = "Copyright 2003 IEEE. Reprinted from Proceedings of the 2002 conference on optoelectronic and microelectronic materials and devices. This material is posted here with permission of the IEEE. Such permission of the IEEE does not in any way imply IEEE endorsement of any of Macquarie University{\^a}€{\texttrademark}s products or services. Internal or personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution must be obtained from the IEEE by writing to [email protected]. By choosing to view this document, you agree to all provisions of the copyright laws protecting it.; Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 ; Conference date: 11-12-2002 Through 13-12-2002",

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Fernandes, AJ, Kane, DM, Gong, B & Lamb, RN 2002, Dehydroxylation of UV fused silica slides via UV laser irradiation. in M Gal (ed.), 2002 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Proceedings., 1237283, Institute of Electrical and Electronics Engineers (IEEE), Piscataway, NJ, pp. 433-436, Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002, Sydney, Australia, 11/12/02. https://doi.org/10.1109/COMMAD.2002.1237283

Dehydroxylation of UV fused silica slides via UV laser irradiation. / Fernandes, A. J.; Kane, D. M.; Gong, B. et al.
2002 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Proceedings. ed. / Michael Gal. Piscataway, NJ: Institute of Electrical and Electronics Engineers (IEEE), 2002. p. 433-436 1237283.

Research output: Chapter in Book/Report/Conference proceeding › Conference proceeding contribution › peer-review

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N1 - Copyright 2003 IEEE. Reprinted from Proceedings of the 2002 conference on optoelectronic and microelectronic materials and devices. This material is posted here with permission of the IEEE. Such permission of the IEEE does not in any way imply IEEE endorsement of any of Macquarie Universityâ€™s products or services. Internal or personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution must be obtained from the IEEE by writing to [email protected]. By choosing to view this document, you agree to all provisions of the copyright laws protecting it.

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T2 - Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002

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Dehydroxylation of UV fused silica slides via UV laser irradiation

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