Destruction and formation of no in low pressure stoichiometric CH4/O2 flames

T. Etzkorn*, S. Muris, J. Wolfrum, C. Dembny, H. Bockhorn, P. F. Nelson, A. Attia-Shahin, J. Warnatz

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

28 Citations (Scopus)

Abstract

A low pressure (10 Torr) stoichiometric CH4/O2 flame seeded with NO was investigated using LIF, REMPI and laser absorption spectroscopy. Relative concentration frofiles of OH, CH, CN and the temperature profile were obtained by laser-induced fluorescence. Relative concentration profiles of CH3 radicals were detected using the REMPI technique. Multipath absorption measurements were used to obtain absolute NO concentrations. The experimental results show that in the low pressure methane-oxygene flame nearly complete removal of the added NO and intermediate formation of CN occurs in the main reaction zone. Furthermore, partial reappearance of NO in the flue gas was observed. In flame structure computations it was not possible to reproduce the experimentally determined NO and CN profiles using the currently available kinetic data on reburn reactions. Further experimental and theoretical studies on the CH1 + NO reactions are therefore required.

Original languageEnglish
Pages (from-to)925-932
Number of pages8
JournalSymposium (International) on Combustion
Volume24
Issue number1
DOIs
Publication statusPublished - 1992
Externally publishedYes

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