Development of incoherent EUV/VUV light sources

tailoring the output pulse characteristics for materials processing applications

R. J. Carman*, B. K. Ward, D. M. Kane

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference proceeding contribution

Abstract

The temporal characteristics of the output pulses generated by an excimer-based incoherent light source operating in the deep ultraviolet between 80nm160nm have been investigated in detail. Generation of output pulses with the highest peak powers, shortest durations (FWHM) and fastest leading-edge risetimes, occurred at the highest operating pressure studied (900mbar).

Original languageEnglish
Title of host publication2010 International Conference on Nanoscience and Nanotechnology (ICONN 2010)
Place of PublicationPiscataway, N.J.
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Pages362-364
Number of pages3
ISBN (Electronic)9781424452620, 9781424452620
ISBN (Print)9781424452613
DOIs
Publication statusPublished - Feb 2010
Event2010 3rd International Conference on Nanoscience and Nanotechnology, ICONN - 2010 - Sydney, Australia
Duration: 22 Feb 201026 Feb 2010

Other

Other2010 3rd International Conference on Nanoscience and Nanotechnology, ICONN - 2010
CountryAustralia
CitySydney
Period22/02/1026/02/10

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Keywords

  • Dielectric barrier discharge
  • Excimer
  • Materials processing
  • Photochemistry
  • Plasma
  • Surface modification
  • Vacuum ultraviolet

Cite this

Carman, R. J., Ward, B. K., & Kane, D. M. (2010). Development of incoherent EUV/VUV light sources: tailoring the output pulse characteristics for materials processing applications. In 2010 International Conference on Nanoscience and Nanotechnology (ICONN 2010) (pp. 362-364). [6045263] Piscataway, N.J.: Institute of Electrical and Electronics Engineers (IEEE). https://doi.org/10.1109/ICONN.2010.6045263