Development of incoherent EUV/VUV light sources: tailoring the output pulse characteristics for materials processing applications

R. J. Carman; B. K. Ward; D. M. Kane

doi:10.1109/ICONN.2010.6045263

Development of incoherent EUV/VUV light sources

tailoring the output pulse characteristics for materials processing applications

R. J. Carman^*, B. K. Ward, D. M. Kane

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference proceeding contribution

Abstract

The temporal characteristics of the output pulses generated by an excimer-based incoherent light source operating in the deep ultraviolet between 80nm160nm have been investigated in detail. Generation of output pulses with the highest peak powers, shortest durations (FWHM) and fastest leading-edge risetimes, occurred at the highest operating pressure studied (900mbar).

Original language	English
Title of host publication	2010 International Conference on Nanoscience and Nanotechnology (ICONN 2010)
Place of Publication	Piscataway, N.J.
Publisher	Institute of Electrical and Electronics Engineers (IEEE)
Pages	362-364
Number of pages	3
ISBN (Electronic)	9781424452620, 9781424452620
ISBN (Print)	9781424452613
DOIs	https://doi.org/10.1109/ICONN.2010.6045263
Publication status	Published - Feb 2010
Event	2010 3rd International Conference on Nanoscience and Nanotechnology, ICONN - 2010 - Sydney, Australia Duration: 22 Feb 2010 → 26 Feb 2010

Other

Other	2010 3rd International Conference on Nanoscience and Nanotechnology, ICONN - 2010
Country	Australia
City	Sydney
Period	22/02/10 → 26/02/10

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Keywords

Dielectric barrier discharge
Excimer
Materials processing
Photochemistry
Plasma
Surface modification
Vacuum ultraviolet

Cite this

Carman, R. J., Ward, B. K., & Kane, D. M. (2010). Development of incoherent EUV/VUV light sources: tailoring the output pulse characteristics for materials processing applications. In 2010 International Conference on Nanoscience and Nanotechnology (ICONN 2010) (pp. 362-364). [6045263] Piscataway, N.J.: Institute of Electrical and Electronics Engineers (IEEE). https://doi.org/10.1109/ICONN.2010.6045263

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title = "Development of incoherent EUV/VUV light sources: tailoring the output pulse characteristics for materials processing applications",

abstract = "The temporal characteristics of the output pulses generated by an excimer-based incoherent light source operating in the deep ultraviolet between 80nm160nm have been investigated in detail. Generation of output pulses with the highest peak powers, shortest durations (FWHM) and fastest leading-edge risetimes, occurred at the highest operating pressure studied (900mbar).",

keywords = "Dielectric barrier discharge, Excimer, Materials processing, Photochemistry, Plasma, Surface modification, Vacuum ultraviolet",

author = "Carman, {R. J.} and Ward, {B. K.} and Kane, {D. M.}",

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language = "English",

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Carman, RJ, Ward, BK & Kane, DM 2010, Development of incoherent EUV/VUV light sources: tailoring the output pulse characteristics for materials processing applications. in 2010 International Conference on Nanoscience and Nanotechnology (ICONN 2010) ., 6045263, Institute of Electrical and Electronics Engineers (IEEE), Piscataway, N.J., pp. 362-364, 2010 3rd International Conference on Nanoscience and Nanotechnology, ICONN - 2010, Sydney, Australia, 22/02/10. https://doi.org/10.1109/ICONN.2010.6045263

Development of incoherent EUV/VUV light sources : tailoring the output pulse characteristics for materials processing applications. / Carman, R. J.; Ward, B. K.; Kane, D. M.

2010 International Conference on Nanoscience and Nanotechnology (ICONN 2010) . Piscataway, N.J. : Institute of Electrical and Electronics Engineers (IEEE), 2010. p. 362-364 6045263.

Research output: Chapter in Book/Report/Conference proceeding › Conference proceeding contribution

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T1 - Development of incoherent EUV/VUV light sources

T2 - tailoring the output pulse characteristics for materials processing applications

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AU - Kane, D. M.

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AB - The temporal characteristics of the output pulses generated by an excimer-based incoherent light source operating in the deep ultraviolet between 80nm160nm have been investigated in detail. Generation of output pulses with the highest peak powers, shortest durations (FWHM) and fastest leading-edge risetimes, occurred at the highest operating pressure studied (900mbar).

KW - Dielectric barrier discharge

KW - Excimer

KW - Materials processing

KW - Photochemistry

KW - Plasma

KW - Surface modification

KW - Vacuum ultraviolet

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DO - 10.1109/ICONN.2010.6045263

M3 - Conference proceeding contribution

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BT - 2010 International Conference on Nanoscience and Nanotechnology (ICONN 2010)

PB - Institute of Electrical and Electronics Engineers (IEEE)

CY - Piscataway, N.J.

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Carman RJ, Ward BK, Kane DM. Development of incoherent EUV/VUV light sources: tailoring the output pulse characteristics for materials processing applications. In 2010 International Conference on Nanoscience and Nanotechnology (ICONN 2010) . Piscataway, N.J.: Institute of Electrical and Electronics Engineers (IEEE). 2010. p. 362-364. 6045263 https://doi.org/10.1109/ICONN.2010.6045263

Access to Document

10.1109/ICONN.2010.6045263

Link to publication in Scopus