Development of moisture-proof polydimethylsiloxane/aluminum oxide film and stability improvement of perovskite solar cells using the film

Eun Young Choi, Ju-Hee Kim, Bu-Jong Kim, Ji Hun Jang, Jincheol Kim*, Nochang Park*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

20 Citations (Scopus)
24 Downloads (Pure)

Abstract

A method for enhancing the moisture barrier property of polydimethylsiloxane (PDMS) polymer films is proposed. This is achieved by filling the PDMS free volume with aluminum oxide (AlOx). To deposit AlOx inside PDMS, thermal atomic layer deposition (ALD) is employed. The PDMS/AlOx film thus produced has a 30 nm AlOx layer on the surface. Its water vapor transmission rate (WVTR) is 5.1 × 10-3 g m-2 d-1 at 45 °C and 65% relative humidity (RH). The activation energy of permeability with the PDMS/AlOx film for moisture permeation is determined to be 35.5 kJ mol-1. To investigate the moisture barrier capability of the PDMS/AlOx layer, (FAPbI3)0.85(MAPbBr3)0.15/spiro-OMeTAD/Au perovskite solar cells are fabricated, and encapsulated by the PDMS/AlOx film. To minimize the thermal damage to solar cells during ALD, AlOx deposition is performed at 95 °C. The solar cells exposed to 45 °C-65% RH for 300 h demonstrate less than a 5% drop in the power-conversion efficiency.

Original languageEnglish
Pages (from-to)11737-11744
Number of pages8
JournalRSC Advances
Volume9
Issue number21
DOIs
Publication statusPublished - 2019
Externally publishedYes

Bibliographical note

Copyright the Publisher 2019. Version archived for private and non-commercial use with the permission of the author/s and according to publisher conditions. For further rights please contact the publisher.

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