Diffusion length of carriers and excitons in GaN - Influence of epilayer microstructure

M. Godlewski*, E. Łusakowska, E. M. Goldys, M. R. Phillips, T. Böttcher, S. Figge, D. Hommel, P. Prystawko, M. Leszczynski, I. Grzegory, S. Porowski

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    15 Citations (Scopus)

    Abstract

    We demonstrate a correlation between the microstructure of epilayers and the diffusion length of free carriers and excitons in heteroepitaxial and homoepitaxial GaN films. We show that the diffusion length is shorter than predicted for a given density of dislocations. With improving structural quality of the films and lower dislocation density the diffusion lengths of free carriers and excitons increase, which, in turn, increases the rate of nonradiative recombination at dislocations. This process may explain a surprisingly small change of light emission efficiency observed for GaN epilayers with varying densities of dislocations.

    Original languageEnglish
    Pages (from-to)294-302
    Number of pages9
    JournalApplied Surface Science
    Volume223
    Issue number4
    DOIs
    Publication statusPublished - 29 Feb 2004

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