DOE manufacture with the DUV SLM-based Sigma7300 laser pattern generator

Peter Björnängen*, Mats Ekberg, Thomas Öström, Hans Fosshaug, Johan Karlsson, Charles Björnberg, Fredrik Nikolajeff, Mikael Karlsson

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    1 Citation (Scopus)


    This paper treats a for the semiconductor industry somewhat different application: The first-ever manufacture of Diffractive Optical Elements (DOE's) as directly written multilevel diffractive micro-reliefs using the DUV SLM-based Sigma7300 Mask. The reliefs were manufactured in the DUV Chemically Amplified Resist (CAR) FEP-171. This particular application is of direct interest since DOE's are already incorporated in the Sigma7300 system. The design and manufacture are demonstrated with (1.) A Fan-out element and (2.) A logotype generator. The first attempts, reported here, resulted in a Fan-out element with diffraction efficiency of 64% compared to the theoretical design of 88%.

    Original languageEnglish
    Pages (from-to)1866-1875
    Number of pages10
    JournalProceedings of SPIE - The International Society for Optical Engineering
    Issue numberPART 3
    Publication statusPublished - 2004


    • Diffractive optical elements
    • DOE
    • Laser pattern generator
    • Multi-level relief, direct-write
    • Resist relief
    • SLM


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