DOE manufacture with the DUV SLM-based Sigma7300 laser pattern generator

Peter Björnängen; Mats Ekberg; Thomas Öström; Hans Fosshaug; Johan Karlsson; Charles Björnberg; Fredrik Nikolajeff; Mikael Karlsson

doi:10.1117/12.535767

DOE manufacture with the DUV SLM-based Sigma7300 laser pattern generator

Peter Björnängen^*, Mats Ekberg, Thomas Öström, Hans Fosshaug, Johan Karlsson, Charles Björnberg, Fredrik Nikolajeff, Mikael Karlsson

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

This paper treats a for the semiconductor industry somewhat different application: The first-ever manufacture of Diffractive Optical Elements (DOE's) as directly written multilevel diffractive micro-reliefs using the DUV SLM-based Sigma7300 Mask. The reliefs were manufactured in the DUV Chemically Amplified Resist (CAR) FEP-171. This particular application is of direct interest since DOE's are already incorporated in the Sigma7300 system. The design and manufacture are demonstrated with (1.) A Fan-out element and (2.) A logotype generator. The first attempts, reported here, resulted in a Fan-out element with diffraction efficiency of 64% compared to the theoretical design of 88%.

Original language	English
Pages (from-to)	1866-1875
Number of pages	10
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	5377
Issue number	PART 3
DOIs	https://doi.org/10.1117/12.535767
Publication status	Published - 2004

Keywords

Diffractive optical elements
DOE
Laser pattern generator
Multi-level relief, direct-write
Resist relief
SLM

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10.1117/12.535767

Cite this

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abstract = "This paper treats a for the semiconductor industry somewhat different application: The first-ever manufacture of Diffractive Optical Elements (DOE's) as directly written multilevel diffractive micro-reliefs using the DUV SLM-based Sigma7300 Mask. The reliefs were manufactured in the DUV Chemically Amplified Resist (CAR) FEP-171. This particular application is of direct interest since DOE's are already incorporated in the Sigma7300 system. The design and manufacture are demonstrated with (1.) A Fan-out element and (2.) A logotype generator. The first attempts, reported here, resulted in a Fan-out element with diffraction efficiency of 64% compared to the theoretical design of 88%.",

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AU - Björnängen, Peter

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AU - Öström, Thomas

AU - Fosshaug, Hans

AU - Karlsson, Johan

AU - Björnberg, Charles

AU - Nikolajeff, Fredrik

AU - Karlsson, Mikael

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DOE manufacture with the DUV SLM-based Sigma7300 laser pattern generator

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Keywords

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