TY - JOUR
T1 - Effect of halide treatments on PbSe quantum dot thin films
T2 - stability, hot carrier lifetime, and application to photovoltaics
AU - Zhang, Zhilong
AU - Yang, Jianfeng
AU - Wen, Xiaoming
AU - Yuan, Lin
AU - Shrestha, Santosh
AU - Stride, John A.
AU - Conibeer, Gavin J.
AU - Patterson, Robert J.
AU - Huang, Shujuan
PY - 2015/10/22
Y1 - 2015/10/22
N2 - Air stability and efficient multiple exciton generation (MEG) are crucial for the application of PbSe quantum dot (QD) thin film in next generation photovoltaics. Recently it was reported that PbS QD thin films with solid-state halide atomic ligands exhibited superior performance in terms of stability and efficiency. There is great interest in applying these halide ligands to PbSe QD thin films to improve the stability, while their additional effects on the hot carrier dynamics and hence MEG efficiency remain unknown. Here, we demonstrate that proper halide treatments can modify both the stability and hot carrier thermalization of a PbSe QD thin film. This confirms that using proper halide ligands in the solid-state ligand exchange step for film fabrication can significantly improve the stability. The film subjected to an iodide treatment exhibited the best air stability, and additionally its hot carrier thermalization time can be three times longer than that with a chloride treatment. We suggest that stronger bonding between the QD surface and the halide ligand can lead to suppressed intermediate-state assisted hot carrier thermalization, while the difference in ligand atomic mass may also play an important role. We conclude that ligands in QD thin films have significant impact on the stability and hot carrier thermalization.
AB - Air stability and efficient multiple exciton generation (MEG) are crucial for the application of PbSe quantum dot (QD) thin film in next generation photovoltaics. Recently it was reported that PbS QD thin films with solid-state halide atomic ligands exhibited superior performance in terms of stability and efficiency. There is great interest in applying these halide ligands to PbSe QD thin films to improve the stability, while their additional effects on the hot carrier dynamics and hence MEG efficiency remain unknown. Here, we demonstrate that proper halide treatments can modify both the stability and hot carrier thermalization of a PbSe QD thin film. This confirms that using proper halide ligands in the solid-state ligand exchange step for film fabrication can significantly improve the stability. The film subjected to an iodide treatment exhibited the best air stability, and additionally its hot carrier thermalization time can be three times longer than that with a chloride treatment. We suggest that stronger bonding between the QD surface and the halide ligand can lead to suppressed intermediate-state assisted hot carrier thermalization, while the difference in ligand atomic mass may also play an important role. We conclude that ligands in QD thin films have significant impact on the stability and hot carrier thermalization.
UR - http://www.scopus.com/inward/record.url?scp=84945317415&partnerID=8YFLogxK
U2 - 10.1021/acs.jpcc.5b08021
DO - 10.1021/acs.jpcc.5b08021
M3 - Article
AN - SCOPUS:84945317415
SN - 1932-7447
VL - 119
SP - 24149
EP - 24155
JO - Journal of Physical Chemistry C
JF - Journal of Physical Chemistry C
IS - 42
ER -