Effects of high pulse repetition frequency on the ablation of polymers

Elizabeth Illy, Michael Withford, Danny Brown, Jim Piper

    Research output: Chapter in Book/Report/Conference proceedingConference proceeding contributionpeer-review

    Abstract

    Measurement of ablation depths and etch rates art, presented for PETG and polyimide (kapton) under pulsed UV(255nm) laser processing for a pulse repetition frequency (prf) range of 750Hz-15kHz using a frequency doubled cop-per vapour laser and a fixed fluence of 0.59 J/cm(2). Results show that the material removal rate (mu m/sec) scales approximately linearly with pulse repetition frequency, and there appears to be no attenuation of the ablating laser beam by the ejected material plume for this fluence. The etch rate (mu m/pulse) increases slightly (similar to 20%) for high prf(15kHz), an effect which is attributed to cumulative heating of the sample.

    Original languageEnglish
    Title of host publicationICALEO'96 - proceedings of the laser materials processing conference
    PublisherLaser Inst of America
    PagesE92-E98
    Number of pages3
    ISBN (Print)0912035544
    Publication statusPublished - 1996
    EventLaser Materials Processing Conference (ICALEO 96) - DETROIT
    Duration: 14 Oct 199617 Oct 1996

    Publication series

    NameLASER INSTITUTE OF AMERICA - PROCEEDINGS
    PublisherLASER INST AMERICA
    Volume81

    Conference

    ConferenceLaser Materials Processing Conference (ICALEO 96)
    CityDETROIT
    Period14/10/9617/10/96

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