Abstract
The use of hydride vapor phase epitaxy to grow p-AlGaN heterojunction light emitting diodes on SiC substrates was discussed. On forward biasing the diodes an intense ultraviolet emission with a peak wavelength near 389 nm was observed. The stability of the device performance at temperatures up to 500 K indicated its possible use in harsh environments. The I-V characteristics of the structure were found comparable to homojunction and heterojunction devices. The use of chemical vapor deposition to grow n-ZnO layers was also discussed.
Original language | English |
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Pages (from-to) | 4719-4721 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 83 |
Issue number | 23 |
DOIs | |
Publication status | Published - 8 Dec 2003 |
Externally published | Yes |