Fabrication of high quality sub-micron Au gratings over large areas with pulsed laser interference lithography for SPR sensors

Alexander Arriola*, Ainara Rodriguez, Noemi Perez, Txaber Tavera, Michael J. Withford, Alexander Fuerbach, Santiago M. Olaizola

*Corresponding author for this work

Research output: Contribution to journalArticle

28 Citations (Scopus)
6 Downloads (Pure)

Abstract

Metallic gratings were fabricated using high energy laser interference lithography with a frequency tripled Nd:YAG nanosecond laser. The grating structures were first recorded in a photosensitive layer and afterwards transferred to an Au film. High quality Au gratings with a period of 770 nm and peak-to-valley heights of 20-60 nm exhibiting plasmonic resonance response were successfully designed, fabricated and characterized.

Original languageEnglish
Pages (from-to)1571-1579
Number of pages9
JournalOptical Materials Express
Volume2
Issue number11
DOIs
Publication statusPublished - Nov 2012

Bibliographical note

This paper was published in Optical materials express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://www.opticsinfobase.org/ome/abstract.cfm?uri=ome-2-11-1571. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.

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