TY - JOUR
T1 - Fabrication of high quality sub-micron Au gratings over large areas with pulsed laser interference lithography for SPR sensors
AU - Arriola, Alexander
AU - Rodriguez, Ainara
AU - Perez, Noemi
AU - Tavera, Txaber
AU - Withford, Michael J.
AU - Fuerbach, Alexander
AU - Olaizola, Santiago M.
N1 - This paper was published in Optical materials express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://www.opticsinfobase.org/ome/abstract.cfm?uri=ome-2-11-1571. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.
PY - 2012/11
Y1 - 2012/11
N2 - Metallic gratings were fabricated using high energy laser interference lithography with a frequency tripled Nd:YAG nanosecond laser. The grating structures were first recorded in a photosensitive layer and afterwards transferred to an Au film. High quality Au gratings with a period of 770 nm and peak-to-valley heights of 20-60 nm exhibiting plasmonic resonance response were successfully designed, fabricated and characterized.
AB - Metallic gratings were fabricated using high energy laser interference lithography with a frequency tripled Nd:YAG nanosecond laser. The grating structures were first recorded in a photosensitive layer and afterwards transferred to an Au film. High quality Au gratings with a period of 770 nm and peak-to-valley heights of 20-60 nm exhibiting plasmonic resonance response were successfully designed, fabricated and characterized.
UR - http://www.scopus.com/inward/record.url?scp=84870382099&partnerID=8YFLogxK
U2 - 10.1364/OME.2.001571
DO - 10.1364/OME.2.001571
M3 - Article
AN - SCOPUS:84870382099
SN - 2159-3930
VL - 2
SP - 1571
EP - 1579
JO - Optical Materials Express
JF - Optical Materials Express
IS - 11
ER -