Fabrication of sub-micron high aspect ratio diamond structures with nanoimprint lithography

M. Karlsson*, I. Vartianen, M. Kuittinen, F. Nikolajeff

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    9 Citations (Scopus)

    Abstract

    Polycrystalline diamond with optical quality has been patterned using nanoimprint lithography. Nanoimprint lithography is a rather new method for fabrication of resist structures with features sizes down to at least 20 nm. The pattern used in this article is a grating with a period of 600 nm and a fill factor of 0.5. Using plasma etching the nanoimprinted grating is etched into a freestanding diamond substrate. We have accomplished the fabrication of 300 nm diamond features with a depth of about 2 μm, which corresponds to an aspect ratio of 7.

    Original languageEnglish
    Pages (from-to)2077-2080
    Number of pages4
    JournalMicroelectronic Engineering
    Volume87
    Issue number11
    DOIs
    Publication statusPublished - Nov 2010

    Keywords

    • CVD diamond
    • Inductively coupled plasma etching
    • Nanoimprint lithography
    • Nanostructures

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