Abstract
Polycrystalline diamond with optical quality has been patterned using nanoimprint lithography. Nanoimprint lithography is a rather new method for fabrication of resist structures with features sizes down to at least 20 nm. The pattern used in this article is a grating with a period of 600 nm and a fill factor of 0.5. Using plasma etching the nanoimprinted grating is etched into a freestanding diamond substrate. We have accomplished the fabrication of 300 nm diamond features with a depth of about 2 μm, which corresponds to an aspect ratio of 7.
Original language | English |
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Pages (from-to) | 2077-2080 |
Number of pages | 4 |
Journal | Microelectronic Engineering |
Volume | 87 |
Issue number | 11 |
DOIs | |
Publication status | Published - Nov 2010 |
Keywords
- CVD diamond
- Inductively coupled plasma etching
- Nanoimprint lithography
- Nanostructures