Fabrication of sub-micron high aspect ratio diamond structures with nanoimprint lithography

M. Karlsson*, I. Vartianen, M. Kuittinen, F. Nikolajeff

*Corresponding author for this work

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Polycrystalline diamond with optical quality has been patterned using nanoimprint lithography. Nanoimprint lithography is a rather new method for fabrication of resist structures with features sizes down to at least 20 nm. The pattern used in this article is a grating with a period of 600 nm and a fill factor of 0.5. Using plasma etching the nanoimprinted grating is etched into a freestanding diamond substrate. We have accomplished the fabrication of 300 nm diamond features with a depth of about 2 μm, which corresponds to an aspect ratio of 7.

Original languageEnglish
Pages (from-to)2077-2080
Number of pages4
JournalMicroelectronic Engineering
Volume87
Issue number11
DOIs
Publication statusPublished - Nov 2010

Keywords

  • CVD diamond
  • Inductively coupled plasma etching
  • Nanoimprint lithography
  • Nanostructures

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