Femtosecond micromachining of high aspect ratio structures in fused silica using bessel beams

M. K. Bhuyan, F. Courvoisier*, P. A. Lacourt, M. Jacquot, L. Furfaro, M. J. Withford, J. M. Dudley

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference proceeding contributionpeer-review

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Abstract

Femtosecond laser micromachining is a laser processing technology with proven potential for the fabrication of a wide range of photonic devices. In the context of developing integrated components for microfluidics, a key issue is the machining of high aspect ratio micro and nano-channels, and the use of diffraction-free Bessel beams for this purpose has attracted much attention. However, although Bessel beams possess several attractive characteristics for this purpose, we show here that their practical use for high aspect ratio micromachining requires a careful selection of focussing and pump laser parameters. We report results of a systematic study of Bessel beam micromachining of structures of diameter < 5 mum in fused silica, and we describe conditions under which high quality and high aspect ratio structures can be reproducibly obtained. Within the parameter regimes identified here, Bessel beams present quantitative advantages when compared to diffractive Gaussian beams, especially for the drilling of channels of sub-10 mum diameter. Outside this parameter regime, there is little benefit in the Bessel beam approach.
Original languageEnglish
Title of host publicationCLEO Europe-EQEC 2009
Subtitle of host publicationEuropean Conference on Lasers and Electro-Optics 2009, and the European Quantum Electronics Conference:14-19 June, 2009, Munich, Germany
Place of PublicationPiscataway, NJ
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Pages1-1
Number of pages1
ISBN (Print)9781424440801
DOIs
Publication statusPublished - 2009
EventCLEO/Europe - EQEC 2009 - European Conference on Lasers and Electro-Optics and the European Quantum Electronics Conference - 2009 - Munich, Germany
Duration: 14 Jun 200919 Jun 2009

Other

OtherCLEO/Europe - EQEC 2009 - European Conference on Lasers and Electro-Optics and the European Quantum Electronics Conference - 2009
CountryGermany
CityMunich
Period14/06/0919/06/09

Bibliographical note

Copyright 2009 IEEE. Reprinted from CLEO Europe-EQEC 2009 : European Conference on Lasers and Electro-Optics 2009, and the European Quantum Electronics Conference :14-19 June, 2009, Munich, Germany. This material is posted here with permission of the IEEE. Such permission of the IEEE does not in any way imply IEEE endorsement of any of Macquarie University’s products or services. Internal or personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution must be obtained from the IEEE by writing to pubs-permissions@ieee.org. By choosing to view this document, you agree to all provisions of the copyright laws protecting it.

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