Focused helium ion beam milling and deposition

S. A. Boden*, Z. Moktadir, D. M. Bagnall, H. Mizuta, H. N. Rutt

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

53 Citations (Scopus)

Abstract

The use of a helium ion microscope with an integrated gas injection system for nanofabrication is explored by demonstrating the milling of fine features into single layered graphene and the controlled deposition of tungsten and platinum wires from gaseous precursors. Using pattern generator software to control the path of the beam, nanoelectronic device designs are transferred directly into graphene. Four point contact designs are also defined on SiO 2/Si surfaces with atomic force microscopy used to characterize the resulting depositions. Although further optimization of the processes is required and questions of beam-induced damage to the delicate graphene lattice are yet to be answered, the helium ion microscope shows potential to go beyond what is possible with Ga+ focused ion beam technologies in nanoscale device fabrication.

Original languageEnglish
Pages (from-to)2452-2455
Number of pages4
JournalMicroelectronic Engineering
Volume88
Issue number8
DOIs
Publication statusPublished - Aug 2011
Externally publishedYes

Keywords

  • beam-induced deposition
  • focused ion beam
  • gas injection system
  • graphene
  • helium ion microscope

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