Focussed ion beam milling of silica microspheres

D. M. Kane, R. J. Chater, D. S. McPhail

Research output: Chapter in Book/Report/Conference proceedingConference proceeding contributionpeer-review

1 Citation (Scopus)

Abstract

Focussed ion beam milling, combined with secondary ion and secondary electron imaging, has been used to evaluate the internal homogeneity of silica glass microspheres. Internal inhomogeneities that will result in non-uniform optical properties are found. The method is demonstrated as suitable for evaluating internal optical quality of the silica microspheres qualitatively. Basic studies to determine whether differences in chemical composition can be differentiated from density differences and topological contouring are required before the technique can be evaluated for more quantitative application.

Original languageEnglish
Title of host publication2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010 Proceedings
Place of PublicationPiscataway, NJ
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Pages109-110
Number of pages2
ISBN (Print)9781424473328
DOIs
Publication statusPublished - 2010
Event2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010 - Canberra, ACT, Australia
Duration: 12 Dec 201015 Dec 2010

Other

Other2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010
CountryAustralia
CityCanberra, ACT
Period12/12/1015/12/10

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