Focussed ion beam milling of silica microspheres

D. M. Kane; R. J. Chater; D. S. McPhail

doi:10.1109/COMMAD.2010.5699684

Focussed ion beam milling of silica microspheres

D. M. Kane, R. J. Chater, D. S. McPhail

Research output: Chapter in Book/Report/Conference proceeding › Conference proceeding contribution › peer-review

1 Citation (Scopus)

Abstract

Focussed ion beam milling, combined with secondary ion and secondary electron imaging, has been used to evaluate the internal homogeneity of silica glass microspheres. Internal inhomogeneities that will result in non-uniform optical properties are found. The method is demonstrated as suitable for evaluating internal optical quality of the silica microspheres qualitatively. Basic studies to determine whether differences in chemical composition can be differentiated from density differences and topological contouring are required before the technique can be evaluated for more quantitative application.

Original language	English
Title of host publication	2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010 Proceedings
Place of Publication	Piscataway, NJ
Publisher	Institute of Electrical and Electronics Engineers (IEEE)
Pages	109-110
Number of pages	2
ISBN (Print)	9781424473328
DOIs	https://doi.org/10.1109/COMMAD.2010.5699684
Publication status	Published - 2010
Event	2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010 - Canberra, ACT, Australia Duration: 12 Dec 2010 → 15 Dec 2010

Other

Other	2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010
Country	Australia
City	Canberra, ACT
Period	12/12/10 → 15/12/10

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10.1109/COMMAD.2010.5699684

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Cite this

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title = "Focussed ion beam milling of silica microspheres",

abstract = "Focussed ion beam milling, combined with secondary ion and secondary electron imaging, has been used to evaluate the internal homogeneity of silica glass microspheres. Internal inhomogeneities that will result in non-uniform optical properties are found. The method is demonstrated as suitable for evaluating internal optical quality of the silica microspheres qualitatively. Basic studies to determine whether differences in chemical composition can be differentiated from density differences and topological contouring are required before the technique can be evaluated for more quantitative application.",

author = "Kane, {D. M.} and Chater, {R. J.} and McPhail, {D. S.}",

year = "2010",

doi = "10.1109/COMMAD.2010.5699684",

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booktitle = "2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010 Proceedings",

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note = "2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010 ; Conference date: 12-12-2010 Through 15-12-2010",

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Kane, DM, Chater, RJ & McPhail, DS 2010, Focussed ion beam milling of silica microspheres. in 2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010 Proceedings., 5699684, Institute of Electrical and Electronics Engineers (IEEE), Piscataway, NJ, pp. 109-110, 2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010, Canberra, ACT, Australia, 12/12/10. https://doi.org/10.1109/COMMAD.2010.5699684

Focussed ion beam milling of silica microspheres. / Kane, D. M.; Chater, R. J.; McPhail, D. S.

2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010 Proceedings. Piscataway, NJ : Institute of Electrical and Electronics Engineers (IEEE), 2010. p. 109-110 5699684.

Research output: Chapter in Book/Report/Conference proceeding › Conference proceeding contribution › peer-review

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BT - 2010 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2010 Proceedings

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Focussed ion beam milling of silica microspheres

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