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GaSb/AlGaSb compound semiconductors grown by MOCVD for optoelectronic applications

A. H. Ramelan*, I. Yahya, Prasodjo, E. M. Goldys

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    Abstract

    AlxGa1-xSb films in the regime 0 ≤ x ≤ 0.30 have been grown by metalorganic chemical vapor deposition on GaAs and GaSb substrates using TMAl, TMGa and TMSb precursors. We report the effects of growth conditions on the optical properties. Samples grown at temperatures of 540° C, 580° C and 600° C and a V/III ratio of 1 have been investigated. The AlxGa1-xSb layers grown at 580°C and 600°C with a V/III ratio of 1 and Al content in the range of 0.5% to 25% were found to exhibit excellent optical quality with a very high optical transmission at energies below the bandgap. The principle photoluminescence features observed are attributed to bound exciton and donor-acceptor transitions with FWHM comparable to the best values reported elsewhere.

    Original languageEnglish
    Pages (from-to)323-329
    Number of pages7
    JournalJournal of Nonlinear Optical Physics and Materials
    Volume15
    Issue number3
    Publication statusPublished - Sept 2006

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