Growth of GaN films by combined laser and microwave plasma enhanced chemical vapour deposition

Bing Zhou, Xin Li*, T. L. Tansley, K. S. A. Butcher, M. R. Phillips

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    14 Citations (Scopus)


    GaN films have been grown on quartz and (011̄2) sapphire substrates using combined ultraviolet excimer laser and microwave plasma enhanced metalorganic chemical vapour deposition (MOCVD) at a substrate temperature of 500°C. Film compositions were analysed by X-ray photoelectron spectroscopy (XPS) and less than 5% residual impurity, principally carbon and oxygen was found. Films grown on quartz were polycrystalline wurtzite with a preferential (0002) orientation, while (0002) and (21̄1̄0) orientations were both found on (011̄2) sapphire. Electron carrier concentration was found to be controllable between 1017 and 1014 cm-3 via control of ammonia plasma injection rate, whilst electron mobility also increased proportionally with the flow rate of the plasma. A room-temperature mobility of 95 cm2 V-1 s-1 was obtained for films on (011̄2) sapphire, saturating at a plasma flow rate of 100 ml/min. The results are interpreted as showing a reduction of nitrogen vacancies by an increase in the reacting species liberated in the plasma.

    Original languageEnglish
    Pages (from-to)249-253
    Number of pages5
    JournalJournal of Crystal Growth
    Issue number3-4
    Publication statusPublished - 1 Jun 1995


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