High-sensitivity x-ray photoelectron spectroscopy characterization of a quantum device structure

Marie Wintrebert-Fouquet*, K. S A Butcher

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    2 Citations (Scopus)

    Abstract

    Characterization of a quantum device structure was performed by high-sensitivity X-ray photoelectron spectroscopy. A semiconductor layer structure grown for the fabrication of resonant tunneling bipolar transistor devices was studied. It is now possible to identify the device layers on the basis of their elemental composition by depth profiling.

    Original languageEnglish
    Pages (from-to)2131-2133
    Number of pages3
    JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
    Volume20
    Issue number6
    DOIs
    Publication statusPublished - Nov 2002

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