In situ deposition of high Tc materials using vacuum arc ablation with macroparticle filter

G. Sloggett*, D. R. McKenzie, D. J. H. Cockayne, G. B. Smith, B. Jenkins, C. P. Foley, Y. Takano, A. J. Studer, J. G. Haub, B. J. Orr

*Corresponding author for this work

Research output: Contribution to journalArticle

Abstract

Vacuum arc ablation is shown to be a new deposition technique for depositing YBCO thin films in situ with zero resistance below 85 K. A high deposition rate was achieved from small specimens. The size of macroparticles is larger than for laser ablation for the same target material, but a curved solenoidal filter was used to reduce the macroparticle content.

Original languageEnglish
Pages (from-to)2353-2354
Number of pages2
JournalPhysica B: Physics of Condensed Matter
Volume194-196
Issue numberPart 2
DOIs
Publication statusPublished - 2 Feb 1994

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