InAs FinFETs performance enhancement by superacid surface treatment

Yuping Zeng, Sourabh Khandelwal, Kazy F. Shariar*, Zijian Wang, Guangyang Lin, Qi Cheng, Peng Cui, Robert Opila, Ganesh Balakrishnan, Sadhvikas Addamane, Peyman Taheri, Daisuke Kiriya, Mark Hettick, Ali Javey

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

In this paper, a post superacid (SA) treatment was proposed to enhance the performance of InAs FinFETs on SiO2/Si substrates. Typically, the subthreshold swing (SS) has reduced from 217 to 170 mV/decade and the transconductance (gm) has increased from 6.44 to 26.5 μS/μm after SA treatment. It was found that the interfacial In2O3 at the InAs/ZrO2 interface was effectively reduced after SA treatment due to the strong protonating nature of the SA solution. As a result, the interface trap density was reduced leading to a pronounced reduction of sheet resistance after SA treatment. The modeling of transfer characteristics indicates that the carrier mobility is enhanced by 5.87.1 folds after SA treatment due to interfacial traps reduction. The results suggest that SA treatment can be potentially extended to other III-V MOSFETs to enhance the device performances.

Original languageEnglish
Pages (from-to)1856-1861
Number of pages6
JournalIEEE Transactions on Electron Devices
Volume66
Issue number4
DOIs
Publication statusPublished - Apr 2019

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