Increased lateral resolution of spheres and aspheres through subaperture stitching interferometry

C. Supranowitz, J. Fleig, G. Forbes, A. Kulawiec, D. Miladinovic, P. Murphy

Research output: Chapter in Book/Report/Conference proceedingConference proceeding contributionpeer-review

5 Citations (Scopus)

Abstract

Optical surface specifications that prescribe the allowable error as a function of spatial frequency, such as limits on the PSD or local slope, are becoming more common. It is often important to characterize errors on an optical surface that range in size from the wavelength of light all the way up to the size of the optic. A range of instruments is required to accurately measure surface errors over this full spectrum and a typical optics shop has gaps in coverage. High-resolution subaperture stitching is one way to extend an instrument's spatial frequency measurement capability and close a problematic gap in this coverage. An explanation of how stitching increases resolution will be discussed and examples will be given that show the benefits of stitching over full-aperture metrology.

Original languageEnglish
Title of host publicationProceedings - ASPE Summer Topical Meeting on Precision Interferometric Metrology, ASPE 2010
Place of PublicationWashington, DC
PublisherSPIE
Pages26-31
Number of pages6
Volume49
ISBN (Print)9781887706544
Publication statusPublished - 2010
Externally publishedYes
EventASPE Summer Topical Meeting on Precision Interferometric Metrology, ASPE 2010 - Asheville, NC, United States
Duration: 23 Jun 201025 Jun 2010

Other

OtherASPE Summer Topical Meeting on Precision Interferometric Metrology, ASPE 2010
CountryUnited States
CityAsheville, NC
Period23/06/1025/06/10

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