Influence of dielectric passivation layer thickness on LeTID in multicrystalline silicon

Utkarshaa Varshney, Malcolm D. Abbott, Shaoyang Liu, Daniel Chen, Moonyong Kim, Chandany Sen, David N. R. Payne, Stuart R. Wenham, Bram Hoex, Catherine Chan

Research output: Chapter in Book/Report/Conference proceedingConference proceeding contributionpeer-review

8 Citations (Scopus)

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Engineering & Materials Science

Chemistry