Influence of photo-inscription conditions on the radiation-response of fiber Bragg gratings

Adriana Morana, Sylvain Girard, Emmanuel Marin, Matthieu Lancry, Claude Marcandella, Philippe Paillet, Laurent Lablonde, Thierry Robin, Robert J. Williams, Michael J. Withford, Aziz Boukenter, Youcef Ouerdane

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Abstract

We compared the sensitivity to X-rays of several fiber Bragg gratings (FBGs) written in the standard telecommunication fiber Corning SMF28 with different techniques. Standard gratings were manufactured with phase-mask and UV lasers, continuum wave (cw) at 244 nm or pulsed in the nanosecond domain at 248 nm, in a pre-hydrogenated fiber. Others gratings were written by exposures to a femtosecond IR-laser (800 nm), with both phase-mask and point by point techniques. The response of these FBGs was studied under X-rays at room temperature and 100°C, by highlighting their similarities and differences. Independently of the inscription technique, the two types of fs-FBGs have showed no big difference up to 1 MGy(SiO2) dose. A discussion on the causes of the radiation-induced peak change is also reported.

Original languageEnglish
Pages (from-to)8659-8669
Number of pages11
JournalOptics Express
Volume23
Issue number7
DOIs
Publication statusPublished - 6 Apr 2015

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Morana, A., Girard, S., Marin, E., Lancry, M., Marcandella, C., Paillet, P., ... Ouerdane, Y. (2015). Influence of photo-inscription conditions on the radiation-response of fiber Bragg gratings. Optics Express, 23(7), 8659-8669. https://doi.org/10.1364/OE.23.008659