Influence of the pre-pulse plasma electron density on the performance of elemental copper vapour lasers

Robert J. Carman, Michael J. Withford, Daniel J. W. Brown, James A. Piper

Research output: Contribution to journalArticleResearchpeer-review

Abstract

A detailed computer model for the kinetics in an elemental copper vapour laser (Cu-Ne-H2) has been used to investigate the importance of the pre-pulse electron density on the performance and lasing characteristics of such a device. The results show that the laser output power and operating efficiency are increased by 65% and 100%, respectively, at a pulse repetition frequency of 17 kHz, if the pre-pulse electron density is reduced by a factor of 5-10. Modelling of the plasma kinetics during the afterglow period suggests that such a reduction is brought about when trace quantities (∼ 0.3%) of HCl are introduced into the plasma to increase the electron density decay rates via dissociative attachment reactions. The predicted improvements in laser performance which occur as a result of a reduced pre-pulse electron density are consistent with the observed operating characteristics of Kinetically Enhanced copper vapour lasers which use HCl-H2-Ne buffer gas mixtures.

LanguageEnglish
Pages99-104
Number of pages6
JournalOptics Communications
Volume157
Issue number1-6
DOIs
Publication statusPublished - 1 Dec 1998

Fingerprint

Carrier concentration
Copper
Vapors
vapors
Plasmas
copper
Lasers
pulses
lasers
Kinetics
kinetics
power efficiency
laser outputs
afterglows
Gas mixtures
decay rates
attachment
gas mixtures
lasing
repetition

Keywords

  • copper laser
  • HCl
  • kinetic enhancement
  • kinetics
  • modelling
  • plasma

Cite this

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abstract = "A detailed computer model for the kinetics in an elemental copper vapour laser (Cu-Ne-H2) has been used to investigate the importance of the pre-pulse electron density on the performance and lasing characteristics of such a device. The results show that the laser output power and operating efficiency are increased by 65{\%} and 100{\%}, respectively, at a pulse repetition frequency of 17 kHz, if the pre-pulse electron density is reduced by a factor of 5-10. Modelling of the plasma kinetics during the afterglow period suggests that such a reduction is brought about when trace quantities (∼ 0.3{\%}) of HCl are introduced into the plasma to increase the electron density decay rates via dissociative attachment reactions. The predicted improvements in laser performance which occur as a result of a reduced pre-pulse electron density are consistent with the observed operating characteristics of Kinetically Enhanced copper vapour lasers which use HCl-H2-Ne buffer gas mixtures.",
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Influence of the pre-pulse plasma electron density on the performance of elemental copper vapour lasers. / Carman, Robert J.; Withford, Michael J.; Brown, Daniel J. W.; Piper, James A.

In: Optics Communications, Vol. 157, No. 1-6, 01.12.1998, p. 99-104.

Research output: Contribution to journalArticleResearchpeer-review

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