Kinetic enhancement of copper vapour lasers for high-power, high-beam-quality output

M. J. Withford*, D. J. W. Brown, R. J. Carman, R. P. Mildren, J. A. Piper

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference proceeding contributionpeer-review

    Abstract

    A strategy was developed for extending the limits of power scaling of copper vapor lasers (CVD) through the use of trace gas additives in the laser mixture to moderate key plasma kinetic processes so as to create the most favorable laser excitation conditions. For kinetic enhancement using HCl, output power increases for small-to-medium scale CVDs of a factor of 3, to 150 W were observed.

    Original languageEnglish
    Title of host publicationConference on Lasers and Electro-Optics Europe - Technical Digest
    Place of PublicationPiscataway, NJ
    PublisherInstitute of Electrical and Electronics Engineers (IEEE)
    Pages342
    Number of pages1
    ISBN (Print)078034233X
    DOIs
    Publication statusPublished - 1998
    EventProceedings of the 1998 International Symposium on Information Theory, CLEO/EUROPE'98 - Glasgow, Scotland
    Duration: 14 Sep 199818 Sep 1998

    Other

    OtherProceedings of the 1998 International Symposium on Information Theory, CLEO/EUROPE'98
    CityGlasgow, Scotland
    Period14/09/9818/09/98

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