Abstract
The output powers from 25 mm (volume 0.49 1) and 40 mm (volume 1.9 1) diameter copper vapour lasers (nominally 20 and 55 W devices) are approximately doubled to > 50 and > 100 W respectively by adding small partial pressures of both H2 and HCl to the neon buffer gas. Our studies show that this gas mixture performs better than a H2-HBr admix, a result we attribute to more efficient reassociation of HCl in the plasma region.
Original language | English |
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Pages (from-to) | 160-166 |
Number of pages | 7 |
Journal | Optics Communications |
Volume | 154 |
Issue number | 1-3 |
DOIs | |
Publication status | Published - 15 Aug 1998 |
Keywords
- copper vapour laser
- dissociative attachment
- halogen
- HCl
- kinetic enhancement
- reassociation