Kinetically enhanced copper vapour lasers employing H2-HCl-Ne buffer gas mixtures

Michael J. Withford*, Daniel J. W. Brown, Robert J. Carman, James A. Piper

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    39 Citations (Scopus)


    The output powers from 25 mm (volume 0.49 1) and 40 mm (volume 1.9 1) diameter copper vapour lasers (nominally 20 and 55 W devices) are approximately doubled to > 50 and > 100 W respectively by adding small partial pressures of both H2 and HCl to the neon buffer gas. Our studies show that this gas mixture performs better than a H2-HBr admix, a result we attribute to more efficient reassociation of HCl in the plasma region.

    Original languageEnglish
    Pages (from-to)160-166
    Number of pages7
    JournalOptics Communications
    Issue number1-3
    Publication statusPublished - 15 Aug 1998


    • copper vapour laser
    • dissociative attachment
    • halogen
    • HCl
    • kinetic enhancement
    • reassociation


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