Abstract
The output powers from 25 mm (volume 0.49 1) and 40 mm (volume 1.9 1) diameter copper vapour lasers (nominally 20 and 55 W devices) are approximately doubled to > 50 and > 100 W respectively by adding small partial pressures of both H2 and HCl to the neon buffer gas. Our studies show that this gas mixture performs better than a H2-HBr admix, a result we attribute to more efficient reassociation of HCl in the plasma region.
| Original language | English |
|---|---|
| Pages (from-to) | 160-166 |
| Number of pages | 7 |
| Journal | Optics Communications |
| Volume | 154 |
| Issue number | 1-3 |
| DOIs | |
| Publication status | Published - 15 Aug 1998 |
Keywords
- copper vapour laser
- dissociative attachment
- halogen
- HCl
- kinetic enhancement
- reassociation
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Withford, M. J., Brown, D. J. W., Carman, R. J., & Piper, J. A. (1998). Kinetically enhanced copper vapour lasers employing H2-HCl-Ne buffer gas mixtures. Optics Communications, 154(1-3), 160-166. https://doi.org/10.1016/S0030-4018(98)00226-0