Kinetically enhanced copper vapour lasers employing H2-HCl-Ne buffer gas mixtures

Michael J. Withford*, Daniel J. W. Brown, Robert J. Carman, James A. Piper

*Corresponding author for this work

Research output: Contribution to journalArticle

39 Citations (Scopus)

Abstract

The output powers from 25 mm (volume 0.49 1) and 40 mm (volume 1.9 1) diameter copper vapour lasers (nominally 20 and 55 W devices) are approximately doubled to > 50 and > 100 W respectively by adding small partial pressures of both H2 and HCl to the neon buffer gas. Our studies show that this gas mixture performs better than a H2-HBr admix, a result we attribute to more efficient reassociation of HCl in the plasma region.

Original languageEnglish
Pages (from-to)160-166
Number of pages7
JournalOptics Communications
Volume154
Issue number1-3
DOIs
Publication statusPublished - 15 Aug 1998

Keywords

  • copper vapour laser
  • dissociative attachment
  • halogen
  • HCl
  • kinetic enhancement
  • reassociation

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