Kinetically enhanced copper vapour lasers employing H2-HCl-Ne buffer gas mixtures

Michael J. Withford; Daniel J. W. Brown; Robert J. Carman; James A. Piper

doi:10.1016/S0030-4018(98)00226-0

Kinetically enhanced copper vapour lasers employing H₂-HCl-Ne buffer gas mixtures

Michael J. Withford^*, Daniel J. W. Brown, Robert J. Carman, James A. Piper

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

39 Citations (Scopus)

Abstract

The output powers from 25 mm (volume 0.49 1) and 40 mm (volume 1.9 1) diameter copper vapour lasers (nominally 20 and 55 W devices) are approximately doubled to > 50 and > 100 W respectively by adding small partial pressures of both H₂ and HCl to the neon buffer gas. Our studies show that this gas mixture performs better than a H₂-HBr admix, a result we attribute to more efficient reassociation of HCl in the plasma region.

Original language	English
Pages (from-to)	160-166
Number of pages	7
Journal	Optics Communications
Volume	154
Issue number	1-3
DOIs	https://doi.org/10.1016/S0030-4018(98)00226-0
Publication status	Published - 15 Aug 1998

Keywords

copper vapour laser
dissociative attachment
halogen
HCl
kinetic enhancement
reassociation

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10.1016/S0030-4018(98)00226-0

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@article{384fead1846a4ece8030e0c00379ea6a,

title = "Kinetically enhanced copper vapour lasers employing H2-HCl-Ne buffer gas mixtures",

abstract = "The output powers from 25 mm (volume 0.49 1) and 40 mm (volume 1.9 1) diameter copper vapour lasers (nominally 20 and 55 W devices) are approximately doubled to > 50 and > 100 W respectively by adding small partial pressures of both H2 and HCl to the neon buffer gas. Our studies show that this gas mixture performs better than a H2-HBr admix, a result we attribute to more efficient reassociation of HCl in the plasma region.",

keywords = "copper vapour laser, dissociative attachment, halogen, HCl, kinetic enhancement, reassociation",

author = "Withford, \{Michael J.\} and Brown, \{Daniel J. W.\} and Carman, \{Robert J.\} and Piper, \{James A.\}",

year = "1998",

month = aug,

day = "15",

doi = "10.1016/S0030-4018(98)00226-0",

language = "English",

volume = "154",

pages = "160--166",

journal = "Optics Communications",

issn = "0030-4018",

publisher = "Elsevier",

number = "1-3",

}

TY - JOUR

T1 - Kinetically enhanced copper vapour lasers employing H2-HCl-Ne buffer gas mixtures

AU - Withford, Michael J.

AU - Brown, Daniel J. W.

AU - Carman, Robert J.

AU - Piper, James A.

PY - 1998/8/15

Y1 - 1998/8/15

N2 - The output powers from 25 mm (volume 0.49 1) and 40 mm (volume 1.9 1) diameter copper vapour lasers (nominally 20 and 55 W devices) are approximately doubled to > 50 and > 100 W respectively by adding small partial pressures of both H2 and HCl to the neon buffer gas. Our studies show that this gas mixture performs better than a H2-HBr admix, a result we attribute to more efficient reassociation of HCl in the plasma region.

AB - The output powers from 25 mm (volume 0.49 1) and 40 mm (volume 1.9 1) diameter copper vapour lasers (nominally 20 and 55 W devices) are approximately doubled to > 50 and > 100 W respectively by adding small partial pressures of both H2 and HCl to the neon buffer gas. Our studies show that this gas mixture performs better than a H2-HBr admix, a result we attribute to more efficient reassociation of HCl in the plasma region.

KW - copper vapour laser

KW - dissociative attachment

KW - halogen

KW - HCl

KW - kinetic enhancement

KW - reassociation

UR - https://www.scopus.com/pages/publications/0032141480

U2 - 10.1016/S0030-4018(98)00226-0

DO - 10.1016/S0030-4018(98)00226-0

M3 - Article

AN - SCOPUS:0032141480

SN - 0030-4018

VL - 154

SP - 160

EP - 166

JO - Optics Communications

JF - Optics Communications

IS - 1-3

ER -

Kinetically enhanced copper vapour lasers employing H₂-HCl-Ne buffer gas mixtures

Abstract

Keywords

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