Large area all-dielectric planar chiral metamaterials by electron beam lithography

W. Zhang*, A. Potts, D. M. Bagnall, B. R. Davidson

*Corresponding author for this work

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

All-dielectric optically active planar chiral metamaterials have been fabricated by electron beam lithography. We have demonstrated the effectiveness of a polymeric charge dispersion layer in dramatically reducing charge buildup during the exposure of chemically amplified resists on dielectric substrates. This technique has allowed the fabrication of large-area high density planar chiral structures with sub- 200 nm resolutions and stitching accuracy. A significant change in the polarization state of visible light transmitted from patterned surfaces is observed, including a maximum 9° change in ellipticity and 22° change in polarization azimuth rotation. These effects are shown to be dependent on the sense of chirality of the surface and the input polarization state of the light. Furthermore, we have also demonstrated that these dielectric planar chiral surfaces, with enantiomeric chiral designs, show a strong modulation in the intensity of the diffracted beams. These optical activities could make these surfaces particularly promising candidates for the development of integrable solid-state polarization sensitive devices.

Original languageEnglish
Pages (from-to)1455-1459
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume24
Issue number3
DOIs
Publication statusPublished - May 2006
Externally publishedYes

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