Abstract
We present a novel laser-based method for fabricating metallic nanostructures in a polymer matrix with sub-wavelength resolution. The method involves two-photon lithography (TPL) in which a femtosecond-pulsed laser induces two-photon initiated in situ reduction of a metal salt and simultaneous polymerization of a negative photoresist. We discuss details of the laser writing process and demonstrate various fabricated functional structures along with simulations of their electromagnetic behavior.
Original language | English |
---|---|
Title of host publication | Technical Proceedings of the 2011 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2011 |
Place of Publication | Boston, MA |
Publisher | CRC Press, Taylor & Francis Group |
Pages | 96-99 |
Number of pages | 4 |
Volume | 2 |
ISBN (Print) | 9781439871393 |
Publication status | Published - 2011 |
Externally published | Yes |
Event | Nanotechnology 2011: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2011 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2011 - Boston, MA, United States Duration: 13 Jun 2011 → 16 Jun 2011 |
Other
Other | Nanotechnology 2011: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2011 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2011 |
---|---|
Country/Territory | United States |
City | Boston, MA |
Period | 13/06/11 → 16/06/11 |