Lead underpotential deposition on Au(110)

Penny Hale*, Stephen Thurgate, Peter Wilkie

*Corresponding author for this work

    Research output: Contribution to journalArticle

    4 Citations (Scopus)

    Abstract

    The electrochemical underpotential deposition (UPD) of lead on Au(110) was investigated by XPS using a custom-built ultrahigh vacuum apparatus containing a chamber for electrochemical studies. A two-step deposition process for lead UPD was confirmed. A large increase in the surface concentration of oxygen was found in solutions containing lead. The presence of lead was detected on the gold surface at all potentials within the range investigated (-500 mV to 1500 mV vs. Ag/AgCl). Degradation of chlorine by x-rays was observed. The change in surface components with potential was investigated and linked to models of UPD and oxidation. The initial random deposition of lead from solution led to surface disordering.

    Original languageEnglish
    Pages (from-to)842-851
    Number of pages10
    JournalSurface and Interface Analysis
    Volume35
    Issue number10
    DOIs
    Publication statusPublished - Oct 2003

    Keywords

    • Au(110)
    • Electrochemistry
    • LEED
    • UHV
    • Underpotential deposition
    • XPS

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