Abstract
Properties of nanocrystalline thin films of selected nitrides are discussed as possible buffer materials for obtaining freestanding GaN wafers. These films are grown by impulse plasma deposition on silicon substrates. We demonstrate high smoothness of these films.
Original language | English |
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Pages (from-to) | 213-218 |
Number of pages | 6 |
Journal | Physica Status Solidi C: Conferences |
Volume | 1 |
Issue number | 2 |
DOIs | |
Publication status | Published - 2004 |