Measuring and modeling the proximity effect in direct-write electron-beam lithography kinoforms

Fredrik Nikolajeff*, Jorgen Bengtsson, Michael Larsson, Mats Ekberg, Sverker Hard

*Corresponding author for this work

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

The proximity effect in successively developed direct-write electron-beam lithography gratings is measured. The grating relief shapes are obtained from the measured power in several of the gratings' diffraction orders. Describing the proximity effect by a convolution with a double Gaussian point-spread function, we determine the parameters of the point-spread function. The writing part of the point-spread function is found to increase significantly with increasing development time, the background part much less.

Original languageEnglish
Pages (from-to)897-903
Number of pages7
JournalDoktorsavhandlingar vid Chalmers Tekniska Hogskola
Issue number1263
Publication statusPublished - Aug 1997

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