The proximity effect in successively developed direct-write electron-beam lithography gratings is measured. The grating relief shapes are obtained from the measured power in several of the gratings' diffraction orders. Describing the proximity effect by a convolution with a double Gaussian point-spread function, we determine the parameters of the point-spread function. The writing part of the point-spread function is found to increase significantly with increasing development time, the background part much less.
- Direct-write electron-beam lithography
- Proximity effect
- Successive development