Optical surface profilers are state-of-the-art instruments for measuring surface height profiles. They are not conventionally applied to nanoparticle measurements due to the presence of diffraction artifacts. Here we use a theoretical model based on wave-optics to account for diffractionbased artifacts in optical surface profilers. This then enables accurate measurement of nanoparticles size of a known geometry. The model is developed for both phase shifting interferometry and vertical scanning interferometry modes of operation. It is demonstrated that nanosphere radii as small as 12 nm, and nano-cylinder radii as small as 10-15 nm can be measured from a standard profile measurement using phase shifted interferometry interpreted using the wave-optics approach.