Methods and systems for providing coherent radiation

    Research output: Patent

    Abstract

    A laser system for generating pulsed laser excitation includes a discharge vessel (104) fabricated from a dielectric material. A resonant laser cavity (106) is located in the discharge vessel (104), the cavity (106) being defined by at least two reflectors of which at least two (118, 120) are disposed at different ends of the cavity (106) along a laser generating path. A gaseous medium is located in the cavity (106) and is capable of undergoing a population inversion when an excitation voltage is applied. A voltage pulse generator (114) is provided for generating an excitation voltage pulse of greater than 20 microseconds in duration and having a peak voltage sufficiently large to cause a population inversion in the gaseous medium. The system also comprises at least one first electrode and at least one second electrode (102, 108, 110), wherein at least one of the electrodes (102) is separated from the gaseous medium by at least a part of the vessel (104), and either the first or the second electrode (102) is electrically coupled to the voltage pulse generator (114). A voltage pulse is applied to the first or second electrode (102), generating a laser pulse in the gaseous medium.

    Original languageEnglish
    Patent numberWO2004079875
    IPCH01S 3/038 2006.1,H01S 3/0975 2006.1,H01S 3/0977 2006.1
    Priority date7/03/03
    Filing date8/03/04
    Publication statusSubmitted - 16 Sept 2004

    Bibliographical note

    Designated States
    AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
    African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
    Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
    European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
    African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)

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