Nanofabrication with the helium ion microscope

Stuart A. Boden, Zakaria Moktadir, Feras M. Alkhalil, Hiroshi Mizuta, Harvey N. Rutt, Darren M. Bagnall

Research output: Chapter in Book/Report/Conference proceedingConference proceeding contributionpeer-review

4 Citations (Scopus)


Although initially developed as an imaging tool, the helium ion microscope (HIM) is finding applications in nanofabrication as its focused ion beam is capable of highly-localized material modification. In this study, an external pattern generator is used to explore the capabilities of the HIM for localized milling of a ∼7 nm thick layer of silicon-on-insulator, with atomic force microscopy (AFM) used to characterize the resulting patterns. The dose and patterned area size are varied and milling to depths >7 nm is demonstrated. At high doses and large areas, protuberances form, primarily due to sub-surface swelling caused by the implanted helium. The results suggest this technique could enable the rapid prototyping of next-generation nanoelectronic devices in thin silicon.

Original languageEnglish
Title of host publicationMechanical Nanofabrication, Nanopatterning and Nanoassembly
Number of pages6
Publication statusPublished - 2011
Externally publishedYes
Event2011 MRS Fall Meeting - Boston, MA, United States
Duration: 28 Nov 20113 Dec 2011


Conference2011 MRS Fall Meeting
Country/TerritoryUnited States
CityBoston, MA


  • ion-beam processing
  • ion-solid interactions
  • si


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